Olga Regelman

Person

Daly City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Distributed electrode array for plasma processing
- Patent number 10,615,004
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed electrode array for plasma processing
- Patent number 10,418,225
- Issue date Sep 17, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed electrode array for plasma processing
- Patent number 10,373,807
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed electrode array for plasma processing
- Patent number 10,312,056
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low electron temperature etch chamber with independent control over...
- Patent number 9,799,491
- Issue date Oct 24, 2017
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heated showerhead assembly
- Patent number 9,570,275
- Issue date Feb 14, 2017
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead insulator and etch chamber liner
- Patent number 9,196,462
- Issue date Nov 24, 2015
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heated showerhead assembly
- Patent number 8,876,024
- Issue date Nov 4, 2014
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling characteristics of a plasma
- Patent number 7,777,599
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma reactor overhead source power electrode with low arcing tend...
- Patent number 7,196,283
- Issue date Mar 27, 2007
- Applied Materials, Inc.
- Douglas A. Buchberger, Jr.
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190287765
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190057840
- Publication date Feb 21, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190057841
- Publication date Feb 21, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190051496
- Publication date Feb 14, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Electron Temperature Etch Chamber with Independent Control Over...
- Publication number 20180053631
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ELECTRON TEMPERATURE ETCH CHAMBER WITH INDEPENDENT CONTROL OVER...
- Publication number 20170125217
- Publication date May 4, 2017
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATED SHOWERHEAD ASSEMBLY
- Publication number 20150053794
- Publication date Feb 26, 2015
- Applied Materials, Inc.
- James D. CARDUCCI
- B32 - LAYERED PRODUCTS
Information Patent Application
SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER
- Publication number 20130327480
- Publication date Dec 12, 2013
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER
- Publication number 20090178763
- Publication date Jul 16, 2009
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATED SHOWERHEAD ASSEMBLY
- Publication number 20090179085
- Publication date Jul 16, 2009
- APPLIED MATERIALS, INC.
- JAMES D. CARDUCCI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING CHARACTERISTICS OF A PLASMA
- Publication number 20090140828
- Publication date Jun 4, 2009
- Applied Materials, Inc.
- Steven C. Shannon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma reactor overhead source power electrode with low arcing tend...
- Publication number 20050178748
- Publication date Aug 18, 2005
- APPLIED MATERIALS, INC.
- Douglas A. Buchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Top gas feed lid for semiconductor processing chamber
- Publication number 20030037879
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- Farahmand E. Askarinam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Olga Regelman

Person

Patents Grantslast 30 patents

Distributed electrode array for plasma processing

Distributed electrode array for plasma processing

Distributed electrode array for plasma processing

Distributed electrode array for plasma processing

Low electron temperature etch chamber with independent control over...

Heated showerhead assembly

Showerhead insulator and etch chamber liner

Heated showerhead assembly

Methods and apparatus for controlling characteristics of a plasma

Plasma reactor overhead source power electrode with low arcing tend...

Patents Applicationslast 30 patents

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

Low Electron Temperature Etch Chamber with Independent Control Over...

LOW ELECTRON TEMPERATURE ETCH CHAMBER WITH INDEPENDENT CONTROL OVER...

HEATED SHOWERHEAD ASSEMBLY

SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER

SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER

HEATED SHOWERHEAD ASSEMBLY

METHODS AND APPARATUS FOR CONTROLLING CHARACTERISTICS OF A PLASMA

Plasma reactor overhead source power electrode with low arcing tend...

Top gas feed lid for semiconductor processing chamber