Olger Victor ZWIER

Person

Nuenen, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,242,203
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,019,377
- Issue date Jun 25, 2024
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method
- Patent number 12,013,647
- Issue date Jun 18, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology targets
- Patent number 11,982,946
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Metrology parameter determination and metrology recipe selection
- Patent number 11,448,974
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Narjes Javaheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Metrology parameter determination and metrology recipe selection
- Patent number 10,990,020
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Narjes Javaheri
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a target, and metrology apparatus
- Patent number 10,606,178
- Issue date Mar 31, 2020
- ASML Netherlands B.V.
- Olger Victor Zwier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS
- Publication number 20230236515
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20230176491
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Olger Victor ZWIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPROVEMENTS IN METROLOGY TARGETS
- Publication number 20220260929
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Nikhil MEHTA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD
- Publication number 20220075276
- Publication date Mar 10, 2022
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS
- Publication number 20220035255
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY PARAMETER DETERMINATION AND METROLOGY RECIPE SELECTION
- Publication number 20210208513
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Narjes JAVAHERI
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method, Patterning Device, Apparatus and Computer Program
- Publication number 20200110342
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Target, and Metrology Apparatus
- Publication number 20190219931
- Publication date Jul 18, 2019
- ASML NETHERLANDS B.V.
- Olger Victor ZWIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY PARAMETER DETERMINATION AND METROLOGY RECIPE SELECTION
- Publication number 20180321597
- Publication date Nov 8, 2018
- ASML NETHERLANDS B.V.
- Narjes JAVAHERI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Olger Victor ZWIER

Person

Patents Grantslast 30 patents

Target for measuring a parameter of a lithographic process

Target for measuring a parameter of a lithographic process

Metrology method

Metrology targets

Metrology parameter determination and metrology recipe selection

Metrology method, patterning device, apparatus and computer program

Metrology method, patterning device, apparatus and computer program

Metrology parameter determination and metrology recipe selection

Method of measuring a target, and metrology apparatus

Patents Applicationslast 30 patents

A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

IMPROVEMENTS IN METROLOGY TARGETS

METROLOGY METHOD

TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

METROLOGY PARAMETER DETERMINATION AND METROLOGY RECIPE SELECTION

Metrology Method, Patterning Device, Apparatus and Computer Program

Method of Measuring a Target, and Metrology Apparatus

METROLOGY PARAMETER DETERMINATION AND METROLOGY RECIPE SELECTION