Oliver DIER

Person

Lauchheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical system, in particular for a microlithographic projection ex...
- Patent number 10,520,827
- Issue date Dec 31, 2019
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,331,048
- Issue date Jun 25, 2019
- Carl Zeiss SMT GmbH
- Oliver Dier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mirror and optical system comprising EUV mirror
- Patent number 10,203,435
- Issue date Feb 12, 2019
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and arrangement for determining the heating condition of a m...
- Patent number 10,161,808
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Peter Vogt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV-mirror, optical system with EUV-mirror and associated operating...
- Patent number 9,997,268
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Udo Dinger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Surface correction of mirrors with decoupling coating
- Patent number 9,921,483
- Issue date Mar 20, 2018
- Carl Zeiss SMT GmbH
- Oliver Dier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element, and optical system of a microlithograph...
- Patent number 9,915,873
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV-mirror arrangement, optical system with EUV-mirror arrangement...
- Patent number 9,442,383
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Udo Dinger
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES I...
- Publication number 20240419066
- Publication date Dec 19, 2024
- Carl Zeiss SMT GMBH
- Uwe BIELKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20190212659
- Publication date Jul 11, 2019
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20190064405
- Publication date Feb 28, 2019
- Carl Zeiss SMT GMBH
- Christian GRASSE
- G02 - OPTICS
Information Patent Application
METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...
- Publication number 20190035512
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Christian Grasse
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20180217507
- Publication date Aug 2, 2018
- Carl Zeiss SMT GMBH
- Oliver DIER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EUV-MIRROR, OPTICAL SYSTEM WITH EUV-MIRROR AND ASSOCIATED OPERATING...
- Publication number 20160379730
- Publication date Dec 29, 2016
- Carl Zeiss SMT GMBH
- Udo DINGER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EUV MIRROR AND OPTICAL SYSTEM COMPRISING EUV MIRROR
- Publication number 20160327702
- Publication date Nov 10, 2016
- Carl Zeiss SMT GMBH
- Thomas SCHICKETANZ
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...
- Publication number 20160266499
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING
- Publication number 20160209750
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Oliver DIER
- G02 - OPTICS
Information Patent Application
Optical Elements Comprising Magnetostrictive Material
- Publication number 20150043060
- Publication date Feb 12, 2015
- Carl Zeiss SMT GMBH
- Peter Huber
- G02 - OPTICS
Information Patent Application
EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT...
- Publication number 20140285783
- Publication date Sep 25, 2014
- Carl Zeiss SMT GMBH
- Udo DINGER
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and arrangement for determining the heating condition of a m...
- Publication number 20130230073
- Publication date Sep 5, 2013
- Peter Vogt
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS
- Publication number 20130176545
- Publication date Jul 11, 2013
- Carl Zeiss SMT GMBH
- Dirk Heinrich Ehm
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Oliver DIER

Person

Patents Grantslast 30 patents

Method for treating a reflective optical element for the EUV wavele...

Optical system, in particular for a microlithographic projection ex...

Mirror, in particular for a microlithographic projection exposure a...

EUV mirror and optical system comprising EUV mirror

Method and arrangement for determining the heating condition of a m...

EUV-mirror, optical system with EUV-mirror and associated operating...

Surface correction of mirrors with decoupling coating

Reflective optical element, and optical system of a microlithograph...

EUV-mirror arrangement, optical system with EUV-mirror arrangement...

Patents Applicationslast 30 patents

METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES I...

OPTICAL SYSTEM, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...

OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME

METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

EUV-MIRROR, OPTICAL SYSTEM WITH EUV-MIRROR AND ASSOCIATED OPERATING...

EUV MIRROR AND OPTICAL SYSTEM COMPRISING EUV MIRROR

REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...

SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING

Optical Elements Comprising Magnetostrictive Material

EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT...

Method and arrangement for determining the heating condition of a m...

PROJECTION EXPOSURE APPARATUS