Oliver Natt

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for operating an illumination system of a microlithographic...
- Patent number 10,222,704
- Issue date Mar 5, 2019
- Carl Zeiss SMT GmbH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for operating an illumination system of a microlithographic...
- Patent number 9,703,206
- Issue date Jul 11, 2017
- Carl Zeiss SMT GmbH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for use in a microlithography projection exposure apparatus
- Patent number 9,568,845
- Issue date Feb 14, 2017
- Carl Zeiss SMT GmbH
- Martin Rocktaeschel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating an illumination system of a microlithographic...
- Patent number 9,341,957
- Issue date May 17, 2016
- Carl Zeiss SMT GmbH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection exposure apparatus for EUV microlithography and method f...
- Patent number 9,298,097
- Issue date Mar 29, 2016
- Carl Zeiss SMT GmbH
- Marc Bienert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating an illumination system of a microlithographic...
- Patent number 9,217,931
- Issue date Dec 22, 2015
- Carl Zeiss SMT GmbH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,116,441
- Issue date Aug 25, 2015
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating an illumination system of a microlithographic...
- Patent number 8,467,033
- Issue date Jun 18, 2013
- Carl Zeiss SMT GmbH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,169,594
- Issue date May 1, 2012
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...
- Publication number 20190155166
- Publication date May 23, 2019
- Carl Zeiss SMT GMBH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...
- Publication number 20180024439
- Publication date Jan 25, 2018
- Carl Zeiss SMT GMBH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...
- Publication number 20160246180
- Publication date Aug 25, 2016
- Carl Zeiss SMT GMBH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...
- Publication number 20160077444
- Publication date Mar 17, 2016
- Carl Zeiss SMT GMBH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...
- Publication number 20130258303
- Publication date Oct 3, 2013
- Carl Zeiss SMT GMBH
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Exposure Apparatus for EUV Microlithography and Method f...
- Publication number 20130250265
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Marc Bienert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
- Publication number 20120229784
- Publication date Sep 13, 2012
- Carl Zeiss SMT GMBH
- Martin ROCKTAESCHEL
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120188527
- Publication date Jul 26, 2012
- Carl Zeiss SMT GMBH
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...
- Publication number 20100321661
- Publication date Dec 23, 2010
- Carl Zeiss SMT AG
- Oliver Natt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20090323043
- Publication date Dec 31, 2009
- Carl Zeiss SMT AG
- Nils Dieckmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSTRUMENT FOR MEASURING THE ANGULAR DISTRIBUTION OF LIGHT PRODUCED...
- Publication number 20080079939
- Publication date Apr 3, 2008
- CARL ZESS SMT AG
- Damian Fiolka
- G01 - MEASURING TESTING

Oliver Natt

Person

Patents Grantslast 30 patents

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Method for operating an illumination system of a microlithographic...

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Method for operating an illumination system of a microlithographic...

Mirror for use in a microlithography projection exposure apparatus

Method for operating an illumination system of a microlithographic...

EUV exposure apparatus with reflective elements having reduced infl...

Projection exposure apparatus for EUV microlithography and method f...

Method for operating an illumination system of a microlithographic...

Illumination system of a microlithographic projection exposure appa...

Method for operating an illumination system of a microlithographic...

Illumination system of a microlithographic projection exposure appa...

Patents Applicationslast 30 patents

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...

Projection Exposure Apparatus for EUV Microlithography and Method f...

EUV Exposure Apparatus

MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

INSTRUMENT FOR MEASURING THE ANGULAR DISTRIBUTION OF LIGHT PRODUCED...