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Olivier MANN
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Berlin, DE
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Patents Grants
last 30 patents
Information
Patent Grant
Acidic aqueous composition for electrolytic copper plating
Patent number
12,071,702
Issue date
Aug 27, 2024
Atotech Deutschland GmbH
Kun Si
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Metal or metal alloy deposition composition and plating compound
Patent number
11,512,405
Issue date
Nov 29, 2022
Atotech Deutschland GmbH
Angela Llavona-Serrano
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Imidazoyl urea polymers and their use in metal or metal alloy plati...
Patent number
11,066,553
Issue date
Jul 20, 2021
Atotech Deutschland GmbH
Heiko Brunner
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Acidic aqueous composition for electrolytic copper plating
Patent number
11,035,051
Issue date
Jun 15, 2021
Atotech Deutschland GmbH
Kun Si
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Aqueous copper plating baths and a method for deposition of copper...
Patent number
10,767,275
Issue date
Sep 8, 2020
Atotech Deutschland GmbH
Heiko Brunner
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Copper electroplating method
Patent number
9,963,797
Issue date
May 8, 2018
Atotech Deutschland GmbH
Andreas Macioβek
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Copper plating bath composition
Patent number
9,551,080
Issue date
Jan 24, 2017
Atotech Deutschland GmbH
Heiko Brunner
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Patents Applications
last 30 patents
Information
Patent Application
ACIDIC AQUEOUS COMPOSITION FOR ELECTROLYTIC COPPER PLATING
Publication number
20210262105
Publication date
Aug 26, 2021
Atotech Deutschland GmbH
Kun SI
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
METAL OR METAL ALLOY DEPOSITION COMPOSITION AND PLATING COMPOUND
Publication number
20200340132
Publication date
Oct 29, 2020
Angela LLAVONA-SERRANO
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
ACIDIC AQUEOUS COMPOSITION FOR ELECTROLYTIC COPPER PLATING
Publication number
20190203369
Publication date
Jul 4, 2019
Atotech Deutschland GmbH
Kun SI
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
IMIDAZOYL UREA POLYMERS AND THEIR USE IN METAL OR METAL ALLOY PLATI...
Publication number
20190144667
Publication date
May 16, 2019
Atotech Deutschland GmbH
Heiko BRUNNER
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
AQUEOUS COPPER PLATING BATHS AND A METHOD FOR DEPOSITION OF COPPER...
Publication number
20180223442
Publication date
Aug 9, 2018
Atotech Deutschland GmbH
Heiko BRUNNER
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
COPPER ELECTROPLATING METHOD
Publication number
20160258077
Publication date
Sep 8, 2016
Atotech Deutschland GmbH
Andreas MACIOßEK
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
COPPER PLATING BATH COMPOSITION
Publication number
20150299883
Publication date
Oct 22, 2015
Atotech Deutschland GmbH
Heiko BRUNNER
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR