Omer Abubaker Omer Adam

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Measuring a process parameter for a manufacturing process involving...
- Patent number 11,320,745
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source separation from metrology data
- Patent number 11,016,397
- Issue date May 25, 2021
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,386,176
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring a process parameter for a manufacturing process involving...
- Patent number 10,073,357
- Issue date Sep 11, 2018
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Method, apparatus and substrates for lithographic metrology
- Patent number 10,042,268
- Issue date Aug 7, 2018
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 9,719,945
- Issue date Aug 1, 2017
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 9,355,200
- Issue date May 31, 2016
- ASML Netherlands B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 9,134,256
- Issue date Sep 15, 2015
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Measuring a Process Parameter for a Manufacturing Process Involving...
- Publication number 20200401054
- Publication date Dec 24, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
SOURCE SEPARATION FROM METROLOGY DATA
- Publication number 20200192229
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring a Process Parameter for a Manufacturing Process Involving...
- Publication number 20190018326
- Publication date Jan 17, 2019
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring a Process Parameter for a Manufacturing Process Involving...
- Publication number 20160349627
- Publication date Dec 1, 2016
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
Method, Apparatus and Substrates for Lithographic Metrology
- Publication number 20160291481
- Publication date Oct 6, 2016
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20160252820
- Publication date Sep 1, 2016
- ASML NETHERLANDS B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20160061589
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20150346116
- Publication date Dec 3, 2015
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20150186581
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20130258310
- Publication date Oct 3, 2013
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G01 - MEASURING TESTING

Omer Abubaker Omer Adam

Person

Patents Grantslast 30 patents

Metrology method, target and substrate

Measuring a process parameter for a manufacturing process involving...

Metrology method, target and substrate

Source separation from metrology data

Metrology method, target and substrate

Metrology method, target and substrate

Measuring a process parameter for a manufacturing process involving...

Method, apparatus and substrates for lithographic metrology

Metrology method and apparatus, lithographic system and device manu...

Method and apparatus for design of a metrology target

Metrology method and apparatus, lithographic system and device manu...

Patents Applicationslast 30 patents

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

Measuring a Process Parameter for a Manufacturing Process Involving...

METROLOGY METHOD, TARGET AND SUBSTRATE

SOURCE SEPARATION FROM METROLOGY DATA

Measuring a Process Parameter for a Manufacturing Process Involving...

Measuring a Process Parameter for a Manufacturing Process Involving...

Method, Apparatus and Substrates for Lithographic Metrology

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

METROLOGY METHOD, TARGET AND SUBSTRATE

Metrology Method and Apparatus, Lithographic System and Device Manu...

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

Metrology Method and Apparatus, Lithographic System and Device Manu...