Ooe Masayuki

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive resin composition, method for producing pat...
- Patent number 9,134,608
- Issue date Sep 15, 2015
- Hitachi Chemical DuPont Microsystems, Ltd.
- Masashi Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,852,726
- Issue date Oct 7, 2014
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 8,304,149
- Issue date Nov 6, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,231,959
- Issue date Jul 31, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 7,851,128
- Issue date Dec 14, 2010
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Positive photosensitive resin composition, method for forming patte...
- Patent number 7,638,254
- Issue date Dec 29, 2009
- Hitachi Chemical DuPont Microsystems Ltd.
- Takashi Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, method for forming patte...
- Patent number 7,435,525
- Issue date Oct 14, 2008
- Hitachi Chemical DuPont Microsystems Ltd.
- Takashi Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 7,150,947
- Issue date Dec 19, 2006
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PAT...
- Publication number 20120288798
- Publication date Nov 15, 2012
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Masashi Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20120263920
- Publication date Oct 18, 2012
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTER...
- Publication number 20110076458
- Publication date Mar 31, 2011
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTE...
- Publication number 20090011364
- Publication date Jan 8, 2009
- Takashi HATTORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20080220222
- Publication date Sep 11, 2008
- Ooe Masayuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photosensitive resin composition, method for forming patte...
- Publication number 20070122733
- Publication date May 31, 2007
- Takashi Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive polymer composition, method of forming relief patter...
- Publication number 20070072122
- Publication date Mar 29, 2007
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photosensitive polymer composition, method of forming relief patter...
- Publication number 20040029045
- Publication date Feb 12, 2004
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Ooe Masayuki

Person

Patents Grantslast 30 patents

Positive photosensitive resin composition, method for producing pat...

Photosensitive polymer composition, method of producing pattern and...

Photosensitive polymer composition, method of forming relief patter...

Photosensitive polymer composition, method of producing pattern and...

Photosensitive polymer composition, method of forming relief patter...

Positive photosensitive resin composition, method for forming patte...

Positive photosensitive resin composition, method for forming patte...

Photosensitive polymer composition, method of forming relief patter...

Patents Applicationslast 30 patents

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PAT...

Photosensitive Polymer Composition, Method of Producing Pattern and...

PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTER...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTE...

Photosensitive Polymer Composition, Method of Producing Pattern and...

Positive photosensitive resin composition, method for forming patte...

Photosensitive polymer composition, method of forming relief patter...

Photosensitive polymer composition, method of forming relief patter...