Osamu Kamimura

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Booster lever unit
- Patent number 12,287,025
- Issue date Apr 29, 2025
- Hitachi Vantara, Ltd.
- Sho Ikeda
- G11 - INFORMATION STORAGE
Information Patent Grant
Electronic computing apparatus and enclosure therefor
- Patent number 11,985,792
- Issue date May 14, 2024
- Hitachi, Ltd.
- Sho Ikeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System, control device, and module
- Patent number 11,214,369
- Issue date Jan 4, 2022
- HAPSMobile Inc.
- Tatsushi Tsutsui
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Charged particle beam apparatus
- Patent number 8,592,776
- Issue date Nov 26, 2013
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam equipments, and charged particle beam microscope
- Patent number 8,022,365
- Issue date Sep 20, 2011
- Hitachi, Ltd.
- Osamu Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam application system
- Patent number 7,385,194
- Issue date Jun 10, 2008
- Hitachi High-Technologies Corporation
- Osamu Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus, charged particle beam exp...
- Patent number 7,173,262
- Issue date Feb 6, 2007
- Canon Kabushiki Kaisha
- Masaki Hosoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of charged particle beam lithography and equipment for charg...
- Patent number 7,105,842
- Issue date Sep 12, 2006
- Hitachi High-Technologies Corporation
- Sayaka Tanimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing equipment and electron beam writing method
- Patent number 7,098,464
- Issue date Aug 29, 2006
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing equipment and electron beam writing method
- Patent number 7,049,607
- Issue date May 23, 2006
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus and electron beam processing appar...
- Patent number 7,041,988
- Issue date May 9, 2006
- Advantest Corp.
- Shinichi Hamaguchi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron beam writing equipment using plural beams and method
- Patent number 7,015,482
- Issue date Mar 21, 2006
- Hitachi, Ltd.
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus, charged particle beam exp...
- Patent number 7,005,659
- Issue date Feb 28, 2006
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam exposure apparatus and method of controlling...
- Patent number 6,969,862
- Issue date Nov 29, 2005
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure equipment and electron beam exposure method
- Patent number 6,838,682
- Issue date Jan 4, 2005
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam writing equipment and electron beam writing method
- Patent number 6,809,319
- Issue date Oct 26, 2004
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Handy-phone with shielded high and low frequency circuits and plana...
- Patent number 6,031,494
- Issue date Feb 29, 2000
- Hitachi, Ltd.
- Hiroshi Okabe
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Multilayered wiring board having printed inductor
- Patent number 5,373,112
- Issue date Dec 13, 1994
- Hitachi, Ltd.
- Osamu Kamimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BOOSTER LEVER UNIT
- Publication number 20230332674
- Publication date Oct 19, 2023
- Hitachi, Ltd
- Sho IKEDA
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
ELECTRONIC COMPUTING APPARATUS AND ENCLOSURE THEREFOR
- Publication number 20230171913
- Publication date Jun 1, 2023
- Hitachi, Ltd
- Sho IKEDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM, CONTROL DEVICE, AND MODULE
- Publication number 20210253243
- Publication date Aug 19, 2021
- HAPSMobile Inc.
- Tatsushi TSUTSUI
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
DIFFRACTION PATTERN CAPTURING METHOD AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20110049344
- Publication date Mar 3, 2011
- Hitachi, Ltd
- Takashi Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20100065753
- Publication date Mar 18, 2010
- Hitachi High-Technologies Corporation
- Momoyo ENYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS AND MANUFACTURING METHOD USING THE SAME
- Publication number 20100033695
- Publication date Feb 11, 2010
- Hitachi, Ltd
- Seiichiro KANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM EQUIPMENTS, AND CHARGED PARTICLE BEAM MICROSCOPE
- Publication number 20090014651
- Publication date Jan 15, 2009
- Hitachi, Ltd.
- Osamu Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20080067376
- Publication date Mar 20, 2008
- Sayaka Tanimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam application system
- Publication number 20070023654
- Publication date Feb 1, 2007
- Osamu Kamimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam exposure apparatus, charged particle beam exp...
- Publication number 20060017019
- Publication date Jan 26, 2006
- Canon Kabushiki Kaisha
- Masaki Hosoda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam writing equipment and electron beam writing method
- Publication number 20050072939
- Publication date Apr 7, 2005
- Hitachi High-Technologies, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of charged particle beam lithography and equipment for charg...
- Publication number 20050072941
- Publication date Apr 7, 2005
- Hitachi High-Technologies, Ltd.
- Sayaka Tanimoto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam writing equipment and electron beam writing method
- Publication number 20050040343
- Publication date Feb 24, 2005
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam exposure apparatus, charged particle beam exp...
- Publication number 20050006601
- Publication date Jan 13, 2005
- Canon Kabushiki Kaisha
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam exposure apparatus and method of controlling...
- Publication number 20040135102
- Publication date Jul 15, 2004
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam writing equipment and electron beam writing method
- Publication number 20040129898
- Publication date Jul 8, 2004
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure equipment and electron beam exposure method
- Publication number 20040119026
- Publication date Jun 24, 2004
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam writing equipment
- Publication number 20040021095
- Publication date Feb 5, 2004
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure apparatus and electron beam processing appar...
- Publication number 20030209674
- Publication date Nov 13, 2003
- Advantest Corporation
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY

Osamu Kamimura

Person

Patents Grantslast 30 patents

Booster lever unit

Electronic computing apparatus and enclosure therefor

System, control device, and module

Charged particle beam apparatus

Charged particle beam equipments, and charged particle beam microscope

Charged particle beam application system

Charged particle beam exposure apparatus, charged particle beam exp...

Method of charged particle beam lithography and equipment for charg...

Electron beam writing equipment and electron beam writing method

Electron beam writing equipment and electron beam writing method

Electron beam exposure apparatus and electron beam processing appar...

Electron beam writing equipment using plural beams and method

Charged particle beam exposure apparatus, charged particle beam exp...

Charged-particle-beam exposure apparatus and method of controlling...

Electron beam exposure equipment and electron beam exposure method

Electron beam writing equipment and electron beam writing method

Handy-phone with shielded high and low frequency circuits and plana...

Multilayered wiring board having printed inductor

Patents Applicationslast 30 patents

BOOSTER LEVER UNIT

ELECTRONIC COMPUTING APPARATUS AND ENCLOSURE THEREFOR

SYSTEM, CONTROL DEVICE, AND MODULE

DIFFRACTION PATTERN CAPTURING METHOD AND CHARGED PARTICLE BEAM DEVICE

CHARGED PARTICLE BEAM APPARATUS

LITHOGRAPHY APPARATUS AND MANUFACTURING METHOD USING THE SAME

CHARGED PARTICLE BEAM EQUIPMENTS, AND CHARGED PARTICLE BEAM MICROSCOPE

CHARGED PARTICLE BEAM APPARATUS

Charged particle beam application system

Charged particle beam exposure apparatus, charged particle beam exp...

Electron beam writing equipment and electron beam writing method

Method of charged particle beam lithography and equipment for charg...

Electron beam writing equipment and electron beam writing method

Charged particle beam exposure apparatus, charged particle beam exp...

Charged-particle-beam exposure apparatus and method of controlling...

Electron beam writing equipment and electron beam writing method

Electron beam exposure equipment and electron beam exposure method

Electron beam writing equipment

Electron beam exposure apparatus and electron beam processing appar...