Osamu Kogure

Person

Tokai, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition and process for forming photo-resi...
- Patent number 4,702,990
- Issue date Oct 27, 1987
- Nippon Telegraph & Telephone Corporation
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming micro-patterns by development
- Patent number 4,690,887
- Issue date Sep 1, 1987
- Nippon Telegraph and Telephone Corporation
- Mitsutoshi Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluoroalkyl acrylate resist material and process for forming fine r...
- Patent number 4,686,168
- Issue date Aug 11, 1987
- Daikin Kogyo Co., Ltd.
- Tsuneo Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material of a siloxane polymer
- Patent number 4,564,579
- Issue date Jan 14, 1986
- Nippon Telegraph & Telephone Public Corporation
- Masao Morita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist material and process for forming fine resist pattern
- Patent number 4,539,250
- Issue date Sep 3, 1985
- Daikin Kogyo Co. Ltd.
- Tsuneo Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material and method for forming pattern therewith
- Patent number 4,507,384
- Issue date Mar 26, 1985
- Nippon Telegraph & Telephone Public Corporation
- Masao Morita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming micropattern
- Patent number 4,426,247
- Issue date Jan 17, 1984
- Nippon Telegraph & Telephone Public Corporation
- Toshiaki Tamamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Osamu Kogure

Person

Patents Grantslast 30 patents

Photosensitive resin composition and process for forming photo-resi...

Method for forming micro-patterns by development

Fluoroalkyl acrylate resist material and process for forming fine r...

Pattern forming material of a siloxane polymer

Resist material and process for forming fine resist pattern

Pattern forming material and method for forming pattern therewith

Method for forming micropattern