Osamu Koike

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Kanagawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma etching apparatus with focus ring and plasma etching method
- Patent number 6,726,799
- Issue date Apr 27, 2004
- Semiconductor Leading Edge Technologies, Inc.
- Osamu Koike
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma etching apparatus with focus ring and plasma etching method
- Publication number 20020072240
- Publication date Jun 13, 2002
- Semiconductor Leading Edge Technologies, Inc.
- Osamu Koike
- H01 - BASIC ELECTRIC ELEMENTS