Osamu Miyahara

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,967,509
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Osamu Miyahara
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,850,697
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Osamu Miyahara
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,731,229
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Osamu Miyahara
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,818,521
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Osamu Miyahara
- B08 - CLEANING
Information Patent Grant
Substrate treatment method, coating treatment apparatus, and substr...
- Patent number 8,703,400
- Issue date Apr 22, 2014
- Tokyo Electron Limited
- Kenji Tsutsumi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Non-transitory storage medium for rinsing or developing sequence
- Patent number 8,398,320
- Issue date Mar 19, 2013
- Tokyo Electron Limited
- Yasuhiro Takaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment method, coating film removing apparatus, and su...
- Patent number 8,366,872
- Issue date Feb 5, 2013
- Tokyo Electron Limited
- Kenji Tsutsumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method, substrate processing system, and compu...
- Patent number 8,083,959
- Issue date Dec 27, 2011
- Tokyo Electron Limited
- Hideharu Kyouda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing method and developing apparatus
- Patent number 8,054,443
- Issue date Nov 8, 2011
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinse treatment method and development process method
- Patent number 7,968,278
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Yasuhiro Takaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating film forming apparatus and method
- Patent number 7,959,988
- Issue date Jun 14, 2011
- Tokyo Electron Limited
- Taro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method, coating treatment apparatus, and substr...
- Patent number 7,926,441
- Issue date Apr 19, 2011
- Tokyo Electron Limited
- Kenji Tsutsumi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Developing method and developing apparatus
- Patent number 7,486,377
- Issue date Feb 3, 2009
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20240307925
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Yoshitomo Sato
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20210187691
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Osamu Miyahara
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20210005471
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Osamu Miyahara
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20190084117
- Publication date Mar 21, 2019
- TOKYO ELECTRON LIMITED
- Osamu Miyahara
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20190043740
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Osamu Miyahara
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...
- Publication number 20120061021
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Hideharu KYOUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD, COATING FILM REMOVING APPARATUS, AND SU...
- Publication number 20110240597
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Kenji TSUTSUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RINSING METHOD AND DEVELOPING METHOD
- Publication number 20110229120
- Publication date Sep 22, 2011
- TOKYO ELECTRON LIMITED
- Yasuhiro TAKAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD, COATING TREATMENT APPARATUS, AND SUBSTR...
- Publication number 20110155693
- Publication date Jun 30, 2011
- TOKYO ELECTRON LIMITED
- Kenji TSUTSUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPING METHOD AND DEVELOPING APPARATUS
- Publication number 20090079948
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- Junichi KITANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinse Treatment Method and Development Process Method
- Publication number 20080274433
- Publication date Nov 6, 2008
- TOKYO ELECTRON LIMITED
- Yasuhiro Takaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD, COATING TREATMENT APPARATUS, AND SUBSTR...
- Publication number 20080176003
- Publication date Jul 24, 2008
- TOKYO ELECTRON LIMITED
- Kenji TSUTSUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD, COATING FILM REMOVING APPARATUS, AND SU...
- Publication number 20080176002
- Publication date Jul 24, 2008
- TOKYO ELECTRON LIMITED
- Kenji TSUTSUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...
- Publication number 20080160781
- Publication date Jul 3, 2008
- TOKYO ELECTRON LIMITED
- Hideharu KYOUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING FILM FORMING APPARATUS AND METHOD
- Publication number 20080124489
- Publication date May 29, 2008
- TOKYO ELECTRON LIMITED
- Taro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Developing method and developing apparatus
- Publication number 20070099129
- Publication date May 3, 2007
- TOKYO ELECTON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Osamu Miyahara

Person

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method, and st...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus, substrate processing method, and st...

Substrate processing apparatus, substrate processing method, and st...

Substrate treatment method, coating treatment apparatus, and substr...

Non-transitory storage medium for rinsing or developing sequence

Substrate treatment method, coating film removing apparatus, and su...

Substrate processing method, substrate processing system, and compu...

Developing method and developing apparatus

Rinse treatment method and development process method

Coating film forming apparatus and method

Substrate treatment method, coating treatment apparatus, and substr...

Developing method and developing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...

SUBSTRATE TREATMENT METHOD, COATING FILM REMOVING APPARATUS, AND SU...

RINSING METHOD AND DEVELOPING METHOD

SUBSTRATE TREATMENT METHOD, COATING TREATMENT APPARATUS, AND SUBSTR...

DEVELOPING METHOD AND DEVELOPING APPARATUS

Rinse Treatment Method and Development Process Method

SUBSTRATE TREATMENT METHOD, COATING TREATMENT APPARATUS, AND SUBSTR...

SUBSTRATE TREATMENT METHOD, COATING FILM REMOVING APPARATUS, AND SU...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...

COATING FILM FORMING APPARATUS AND METHOD

Developing method and developing apparatus