Osamu NOZAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 12,153,338
- Issue date Nov 26, 2024
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method of manufacturing imprint mold, method of manufac...
- Patent number 12,007,684
- Issue date Jun 11, 2024
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, method for manufacturing reflective mask, and method fo...
- Patent number 11,762,279
- Issue date Sep 19, 2023
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,720,014
- Issue date Aug 8, 2023
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 11,630,388
- Issue date Apr 18, 2023
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,333,966
- Issue date May 17, 2022
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 11,281,089
- Issue date Mar 22, 2022
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 11,231,645
- Issue date Jan 25, 2022
- Hoya Corporation
- Hiroaki Shishido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, method for manufacturing thereof, and...
- Patent number 11,226,549
- Issue date Jan 18, 2022
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, method for manufacturing phase shift...
- Patent number 11,054,735
- Issue date Jul 6, 2021
- Hoya Corporation
- Takenori Kajiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blanks, phase shift mask, method for manufacturing phase shift...
- Patent number 11,016,382
- Issue date May 25, 2021
- Hoya Corporation
- Atsushi Kominato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 10,942,441
- Issue date Mar 9, 2021
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 10,942,442
- Issue date Mar 9, 2021
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, method of manufacturing phase shift m...
- Patent number 10,942,440
- Issue date Mar 9, 2021
- Hoya Corporation
- Hiroyuki Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, phase shift mask manufacturing method...
- Patent number 10,935,881
- Issue date Mar 2, 2021
- Hoya Corporation
- Takenori Kajiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 10,915,016
- Issue date Feb 9, 2021
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 10,606,164
- Issue date Mar 31, 2020
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, transfer mask, method for manufacturing transfer mask,...
- Patent number 10,571,797
- Issue date Feb 25, 2020
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blanks, phase shift mask, and method for manufacturing semicon...
- Patent number 10,551,733
- Issue date Feb 4, 2020
- Hoya Corporation
- Atsushi Kominato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, method for manufacturing phase shift...
- Patent number 10,551,734
- Issue date Feb 4, 2020
- Hoya Corporation
- Hiroaki Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 10,539,866
- Issue date Jan 21, 2020
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, transfer mask, method for manufacturing transfer mask,...
- Patent number 10,527,931
- Issue date Jan 7, 2020
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 10,495,966
- Issue date Dec 3, 2019
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, method of manufacturing transfer mask an...
- Patent number 10,481,485
- Issue date Nov 19, 2019
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 10,481,486
- Issue date Nov 19, 2019
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, method for manufacturing phase shift...
- Patent number 10,365,556
- Issue date Jul 30, 2019
- Hoya Corporation
- Hiroaki Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, transfer mask and methods of manufacturing the same
- Patent number 10,365,555
- Issue date Jul 30, 2019
- Hoya Corporation
- Hiroaki Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 10,261,409
- Issue date Apr 16, 2019
- HOYA CORPORATION
- Hiroaki Shishido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, method for manufacturing phase shift...
- Patent number 10,146,123
- Issue date Dec 4, 2018
- Hoya Corporation
- Hiroaki Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 10,114,281
- Issue date Oct 30, 2018
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20240337919
- Publication date Oct 10, 2024
- HOYA CORPORATION
- Kenta TSUKAGOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20240184194
- Publication date Jun 6, 2024
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20240053672
- Publication date Feb 15, 2024
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20230393457
- Publication date Dec 7, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING IMPRINT MOLD, METHOD OF MANUFAC...
- Publication number 20230367196
- Publication date Nov 16, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20230314929
- Publication date Oct 5, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20230259015
- Publication date Aug 17, 2023
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20230194973
- Publication date Jun 22, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20230142180
- Publication date May 11, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20230097280
- Publication date Mar 30, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220390826
- Publication date Dec 8, 2022
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR...
- Publication number 20220252972
- Publication date Aug 11, 2022
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20220214608
- Publication date Jul 7, 2022
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20220179300
- Publication date Jun 9, 2022
- HOYA CORPORATION
- Hiroaki SHISHIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FO...
- Publication number 20220163880
- Publication date May 26, 2022
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20220128898
- Publication date Apr 28, 2022
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20220121104
- Publication date Apr 21, 2022
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...
- Publication number 20220043335
- Publication date Feb 10, 2022
- HOYA CORPORATION
- Ryo OHKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...
- Publication number 20220035235
- Publication date Feb 3, 2022
- HOYA CORPORATION
- Ryo OHKUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20210364909
- Publication date Nov 25, 2021
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...
- Publication number 20210149294
- Publication date May 20, 2021
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20210026235
- Publication date Jan 28, 2021
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...
- Publication number 20200150524
- Publication date May 14, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANKS, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT...
- Publication number 20200117077
- Publication date Apr 16, 2020
- HOYA CORPORATION
- Atsushi KOMINATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20200064725
- Publication date Feb 27, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING THEREOF, AND...
- Publication number 20200064726
- Publication date Feb 27, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE-SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20200064727
- Publication date Feb 27, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20200033718
- Publication date Jan 30, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...
- Publication number 20190187550
- Publication date Jun 20, 2019
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20190187551
- Publication date Jun 20, 2019
- HOYA CORPORATION
- Hiroyuki IWASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Osamu NOZAWA

Person

Patents Grantslast 30 patents

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, method of manufacturing imprint mold, method of manufac...

Mask blank, method for manufacturing reflective mask, and method fo...

Mask blank, phase shift mask, and method of manufacturing semicondu...

Mask blank, method for manufacturing phase shift mask, and method f...

Mask blank, phase shift mask, and method of manufacturing semicondu...

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, phase shift mask, method for manufacturing thereof, and...

Mask blank, phase shift mask, method for manufacturing phase shift...

Mask blanks, phase shift mask, method for manufacturing phase shift...

Mask blank, phase shift mask, and method for manufacturing semicond...

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Mask blank, phase shift mask, method of manufacturing phase shift m...

Mask blank, phase shift mask, phase shift mask manufacturing method...

Mask blank, method for manufacturing phase shift mask, and method f...

Mask blank, phase shift mask, and method for manufacturing semicond...

Mask blank, transfer mask, method for manufacturing transfer mask,...

Mask blanks, phase shift mask, and method for manufacturing semicon...

Mask blank, phase shift mask, method for manufacturing phase shift...

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Mask blank, transfer mask, method for manufacturing transfer mask,...

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Mask blank, transfer mask, method of manufacturing transfer mask an...

Mask blank, phase shift mask, and method for manufacturing semicond...

Mask blank, phase shift mask, method for manufacturing phase shift...

Mask blank, transfer mask and methods of manufacturing the same

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, phase shift mask, method for manufacturing phase shift...

Mask blank, phase shift mask, and method for manufacturing semicond...

Patents Applicationslast 30 patents

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

MASK BLANK, METHOD OF MANUFACTURING IMPRINT MOLD, METHOD OF MANUFAC...

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FO...

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD F...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK,...

MASK BLANKS, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING THEREOF, AND...

MASK BLANK, PHASE-SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR...

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...