Osamu Okada

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Kanagawa-ken, JP

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Patents Grantslast 30 patents

Information Patent Grant
Single substrate processing CVD procedure for depositing a metal fi...
- Patent number 6,387,444
- Issue date May 14, 2002
- Anelva Corporation
- Osamu Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning metallic films built up within thin film deposit...
- Patent number 5,993,679
- Issue date Nov 30, 1999
- Anelva Corporation
- Tomoaki Koide
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CVD apparatus and CVD method for copper deposition
- Publication number 20010006701
- Publication date Jul 5, 2001
- Akiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...