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Osamu Suga
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Kokubunji-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Method of inspecting mask, mask inspection device, and method of ma...
Patent number
9,229,314
Issue date
Jan 5, 2016
Renesas Electronics Corporation
Tsuneo Terasawa
G01 - MEASURING TESTING
Information
Patent Grant
Method of inspecting mask, mask inspection device, and method of ma...
Patent number
9,063,098
Issue date
Jun 23, 2015
Renesas Electronics Corporation
Tsuneo Terasawa
G01 - MEASURING TESTING
Information
Patent Grant
Method of inspecting mask pattern and mask pattern inspection appar...
Patent number
8,488,866
Issue date
Jul 16, 2013
Renesas Electronics Corporation
Tsuneo Terasawa
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Reflection-type exposure mask and method of manufacturing a semicon...
Patent number
8,173,332
Issue date
May 8, 2012
Kabushiki Kaisha Toshiba
Takashi Kamo
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Reflective-type mask
Patent number
7,960,076
Issue date
Jun 14, 2011
Kabushiki Kaisha Toshiba
Takashi Kamo
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Method for designing a semiconductor integrated circuit layout capa...
Patent number
7,844,934
Issue date
Nov 30, 2010
Renesas Electronics Corporation
Yusaku Ono
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
3-D structure design system, a method for designing 3-D structure a...
Patent number
6,873,942
Issue date
Mar 29, 2005
Original Engineering Consultants Co., Ltd.
Osamu Suga
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Electron beam lithography system and method
Patent number
5,424,173
Issue date
Jun 13, 1995
Hitachi, Ltd.
Hiroaki Wakabayashi
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Electron beam lithography system and method
Patent number
5,097,138
Issue date
Mar 17, 1992
Hitachi, Ltd.
Hiroaki Wakabayashi
B82 - NANO-TECHNOLOGY
Patents Applications
last 30 patents
Information
Patent Application
METHOD OF INSPECTING MASK, MASK INSPECTION DEVICE, AND METHOD OF MA...
Publication number
20150253658
Publication date
Sep 10, 2015
Renesas Electronics Corporation
Tsuneo TERASAWA
G01 - MEASURING TESTING
Information
Patent Application
METHOD OF INSPECTING MASK, MASK INSPECTION DEVICE, AND METHOD OF MA...
Publication number
20130017475
Publication date
Jan 17, 2013
Renesas Electronics Corporation
Tsuneo TERASAWA
G01 - MEASURING TESTING
Information
Patent Application
REFLECTIVE EXPOSURE MASK, METHOD OF MANUFACTURING REFLECTIVE EXPOSU...
Publication number
20110117479
Publication date
May 19, 2011
RENESAS ELECTRONICS CORPORATION
Osamu SUGA
B82 - NANO-TECHNOLOGY
Information
Patent Application
REFLECTION-TYPE EXPOSURE MASK AND METHOD OF MANUFACTURING A SEMICON...
Publication number
20110020737
Publication date
Jan 27, 2011
Takashi Kamo
B82 - NANO-TECHNOLOGY
Information
Patent Application
METHOD OF INSPECTING MASK PATTERN AND MASK PATTERN INSPECTION APPAR...
Publication number
20100208978
Publication date
Aug 19, 2010
NEC ELECTRONICS CORPORAITON
Tsuneo TERASAWA
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
REFLECTIVE-TYPE MASK
Publication number
20090148781
Publication date
Jun 11, 2009
Takashi KAMO
B82 - NANO-TECHNOLOGY
Information
Patent Application
Method for designing semiconductor integrated circuit layout
Publication number
20070124714
Publication date
May 31, 2007
Renesas Technology Corp.
Yusaku Ono
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
Method for designing mask pattern and method for manufacturing semi...
Publication number
20070074146
Publication date
Mar 29, 2007
RENESAS TECHNOLOGY CORP.
Toshihiko Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY