Osamu Tamada

Person

Kyoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus
- Patent number 9,687,886
- Issue date Jun 27, 2017
- SCREEN Holdings Co., Ltd.
- Tomohiro Goto
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,059,221
- Issue date Jun 16, 2015
- SCREEN Holdings Co., Ltd.
- Tomohiro Goto
- F26 - DRYING
Information Patent Grant
Substrate processing apparatus
- Patent number 8,286,576
- Issue date Oct 16, 2012
- Sokudo Co., Ltd.
- Osamu Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus
- Patent number 7,926,439
- Issue date Apr 19, 2011
- Dainippon Screen Mfg. Co., Ltd.
- Masakazu Sanada
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate treating method and apparatus
- Patent number 7,105,074
- Issue date Sep 12, 2006
- Dainippon Screen Mfg. Co., Ltd.
- Osamu Tamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 6,692,165
- Issue date Feb 17, 2004
- Dainippon Screen Mfg. Co., Ltd.
- Akiko Tanaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150217335
- Publication date Aug 6, 2015
- SCREEN Holdings Co., Ltd.
- Tomohiro GOTO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20100126532
- Publication date May 27, 2010
- Dainippon Screen Mfg. Co., Ltd.
- Osamu Tamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20090269936
- Publication date Oct 29, 2009
- SOKUDO CO., LTD.
- Osamu Tamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20090070946
- Publication date Mar 19, 2009
- SOKUDO CO., LTD.
- Osamu Tamada
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080053487
- Publication date Mar 6, 2008
- Tomohiro Goto
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20080022928
- Publication date Jan 31, 2008
- Masakazu Sanada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080008973
- Publication date Jan 10, 2008
- Tomohiro Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTION FILM FORMING METHOD, AND SUBSTRATE TREATING APPARATUS
- Publication number 20070183051
- Publication date Aug 9, 2007
- Osamu Tamada
- G02 - OPTICS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20050205113
- Publication date Sep 22, 2005
- Dainippon Screen Mfg. Co., Ltd.
- Osamu Tamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treating method and apparatus
- Publication number 20030017665
- Publication date Jan 23, 2003
- Dainippon Screen Mfg. Co., Ltd.
- Osamu Tamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus
- Publication number 20020121341
- Publication date Sep 5, 2002
- Dainippon Screen Mfg. Co., Ltd.
- Akiko Tanaka
- H01 - BASIC ELECTRIC ELEMENTS

Osamu Tamada

Person

Patents Grantslast 30 patents

Substrate processing apparatus

Substrate processing method and substrate processing apparatus

Substrate processing apparatus

Substrate processing apparatus

Substrate treating method and apparatus

Substrate processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Substrate Processing Apparatus

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

ANTIREFLECTION FILM FORMING METHOD, AND SUBSTRATE TREATING APPARATUS

Substrate processing apparatus and substrate processing method

Substrate treating method and apparatus

Substrate processing apparatus