Oscar Franciscus Jozephus Noordman

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Polarization control apparatus and method
- Patent number 8,189,173
- Issue date May 29, 2012
- ASML Netherlands B.V.
- Marcel Henk André Janssens
- G02 - OPTICS
Information Patent Grant
Pulse modifier with adjustable etendue
- Patent number 8,004,770
- Issue date Aug 23, 2011
- ASML Holding N.V.
- Adel Joobeur
- G02 - OPTICS
Information Patent Grant
Stage apparatus, lithographic apparatus and device manufacturing me...
- Patent number 7,924,406
- Issue date Apr 12, 2011
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using an interferometer as a high speed variable attenuator
- Patent number 7,898,646
- Issue date Mar 1, 2011
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G02 - OPTICS
Information Patent Grant
Radiation beam pulse trimming
- Patent number 7,826,037
- Issue date Nov 2, 2010
- ASML Netherlands B.V.
- Huibert Visser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation beam pulse trimming
- Patent number 7,738,079
- Issue date Jun 15, 2010
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using an interferometer as a high speed variable attenuator
- Patent number 7,683,300
- Issue date Mar 23, 2010
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus having masking parts and device manufacturin...
- Patent number 7,671,968
- Issue date Mar 2, 2010
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation pulse energy control system, lithographic apparatus and d...
- Patent number 7,626,182
- Issue date Dec 1, 2009
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Increasing pulse-to-pulse radiation beam uniformity
- Patent number 7,453,551
- Issue date Nov 18, 2008
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Pulse Modifier with Adjustable Etendue
- Publication number 20110255173
- Publication date Oct 20, 2011
- ASML NETHERLANDS B.V.
- Adel JOOBEUR
- G02 - OPTICS
Information Patent Application
Polarization Control Apparatus and Method
- Publication number 20090201483
- Publication date Aug 13, 2009
- ASML NETHERLANDS B.V.
- Marcel Henk Andre JANSSENS
- G02 - OPTICS
Information Patent Application
Using an interferometer as a high speed variable attenuator
- Publication number 20080117494
- Publication date May 22, 2008
- ASML Holding N.V.
- Oscar Franciscus Jozephus Noordman
- G02 - OPTICS
Information Patent Application
Radiation Beam Pulse Trimming
- Publication number 20080111981
- Publication date May 15, 2008
- ASML NETHERLANDS B.V.
- Huibert VISSER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Increasing pulse-to-pulse radiation beam uniformity
- Publication number 20080111982
- Publication date May 15, 2008
- ASML NETHERLANDS B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation beam pulse trimming
- Publication number 20080112030
- Publication date May 15, 2008
- ASML NETHERLANDS B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation pulse energy control system, lithographic apparatus and d...
- Publication number 20080054190
- Publication date Mar 6, 2008
- ASML NETHERLANDS B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage apparatus, lithographic apparatus and device manufacturing me...
- Publication number 20070013885
- Publication date Jan 18, 2007
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage apparatus, lithographic apparatus and device manufacturing me...
- Publication number 20070013890
- Publication date Jan 18, 2007
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Oscar Franciscus Jozephus Noordman

Person

Patents Grantslast 30 patents

Polarization control apparatus and method

Pulse modifier with adjustable etendue

Stage apparatus, lithographic apparatus and device manufacturing me...

Using an interferometer as a high speed variable attenuator

Radiation beam pulse trimming

Radiation beam pulse trimming

Using an interferometer as a high speed variable attenuator

Lithographic apparatus having masking parts and device manufacturin...

Radiation pulse energy control system, lithographic apparatus and d...

Increasing pulse-to-pulse radiation beam uniformity

Patents Applicationslast 30 patents

Pulse Modifier with Adjustable Etendue

Polarization Control Apparatus and Method

Using an interferometer as a high speed variable attenuator

Radiation Beam Pulse Trimming

Increasing pulse-to-pulse radiation beam uniformity

Radiation beam pulse trimming

Radiation pulse energy control system, lithographic apparatus and d...

Stage apparatus, lithographic apparatus and device manufacturing me...

Stage apparatus, lithographic apparatus and device manufacturing me...