Oswald Gromer

Person

Heidenheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system and projection objective of a mask inspection a...
- Patent number 10,114,293
- Issue date Oct 30, 2018
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 10,042,271
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,696,639
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,001,304
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for range-resolved determination of scattered lig...
- Patent number 7,755,748
- Issue date Jul 13, 2010
- Carl Zeiss SMT AG
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for the range-resolved determination of scattered light, ope...
- Patent number 7,408,631
- Issue date Aug 5, 2008
- Carl Zeiss SMT AG
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20190129318
- Publication date May 2, 2019
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20180024445
- Publication date Jan 25, 2018
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20150212431
- Publication date Jul 30, 2015
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...
- Publication number 20130038850
- Publication date Feb 14, 2013
- CARL ZEISS SMT GMBH
- Heiko Feldmann
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20110013171
- Publication date Jan 20, 2011
- Carl Zeiss SMT AG
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR RANGE-RESOLVED DETERMINATION OF SCATTERED LIG...
- Publication number 20080285018
- Publication date Nov 20, 2008
- Carl Zeiss SMT AG
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device for the range-resolved determination of scattered light, ope...
- Publication number 20050264819
- Publication date Dec 1, 2005
- Carl Zeiss SMT AG
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Oswald Gromer

Person

Patents Grantslast 30 patents

Illumination system and projection objective of a mask inspection a...

Projection exposure system for microlithography with a measurement...

Projection exposure system for microlithography with a measurement...

Projection exposure system for microlithography with a measurement...

Device and method for range-resolved determination of scattered lig...

Device for the range-resolved determination of scattered light, ope...

Patents Applicationslast 30 patents

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

DEVICE AND METHOD FOR RANGE-RESOLVED DETERMINATION OF SCATTERED LIG...

Device for the range-resolved determination of scattered light, ope...