Owendi Ongayi

Person

Marlborough, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coating compositions for photolithography
- Patent number 10,754,249
- Issue date Aug 25, 2020
- Rohm and Haas Electronic Materials LLC
- Anthony Zampini
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 10,481,494
- Issue date Nov 19, 2019
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 10,365,562
- Issue date Jul 30, 2019
- Rohm and Haas Electronic Materials LLC
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for photolithography
- Patent number 9,690,199
- Issue date Jun 27, 2017
- Rohm and Haas Electronic Materials LLC
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid-generating copolymer and associated photoresist compositi...
- Patent number 9,581,901
- Issue date Feb 28, 2017
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer composition, photoresist comprising the polymer composition...
- Patent number 9,459,533
- Issue date Oct 4, 2016
- Dow Global Technologies LLC
- Matthew D. Christianson
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating compositions for photolithography
- Patent number 9,323,154
- Issue date Apr 26, 2016
- Rohm and Haas Electronic Materials, LLC
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 9,244,352
- Issue date Jan 26, 2016
- Rohm and Haas Electronic Materials, LLC
- Anthony Zampini
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoacid-generating copolymer and associated photoresist compositi...
- Patent number 9,229,319
- Issue date Jan 5, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive copolymer, photoresist comprising the copolymer, and...
- Patent number 9,206,276
- Issue date Dec 8, 2015
- Rohm and Haas Electronic Materials LLC
- Owendi Ongayi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive copolymer, photoresist comprising the copolymer, and...
- Patent number 9,182,662
- Issue date Nov 10, 2015
- Rohm and Haas Electronic Materials LLC
- Owendi Ongayi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer with acid-labile group, photoresist composition, coated s...
- Patent number 9,182,669
- Issue date Nov 10, 2015
- Rohm and Haas Electronic Materials LLC
- Owendi Ongayi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 8,968,981
- Issue date Mar 3, 2015
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators
- Patent number 8,932,797
- Issue date Jan 13, 2015
- Dow Global Technologies LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable photoacid generators
- Patent number 8,900,792
- Issue date Dec 2, 2014
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive copolymer and photoresist composition
- Patent number 8,703,383
- Issue date Apr 22, 2014
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 8,501,383
- Issue date Aug 6, 2013
- Rohm and Haas Electronic Materials LLC
- Anthony Zampini
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions for photolithography
- Patent number 8,455,178
- Issue date Jun 4, 2013
- Rohm and Haas Electronic Materials LLP
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20190354015
- Publication date Nov 21, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY
- Publication number 20170285478
- Publication date Oct 5, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY
- Publication number 20160223911
- Publication date Aug 4, 2016
- Rohm and Haas Electronic Materials, L.L.C.
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...
- Publication number 20150177615
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...
- Publication number 20150177613
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED S...
- Publication number 20150177614
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND...
- Publication number 20140242521
- Publication date Aug 28, 2014
- Owendi Ongayi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY
- Publication number 20140030653
- Publication date Jan 30, 2014
- Anthony ZAMPINI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOSITION, PHOTORESIST COMPRISING THE POLYMER COMPOSITION...
- Publication number 20140004464
- Publication date Jan 2, 2014
- Rohm and Haas Electronic Materials L.L.C.
- Matthew D. CHRISTIANSON
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND...
- Publication number 20130209934
- Publication date Aug 15, 2013
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20130004901
- Publication date Jan 3, 2013
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20130004893
- Publication date Jan 3, 2013
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POLYMERIZABLE PHOTOACID GENERATORS
- Publication number 20120171616
- Publication date Jul 5, 2012
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID GENERATORS
- Publication number 20120141939
- Publication date Jun 7, 2012
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION
- Publication number 20120129105
- Publication date May 24, 2012
- Rohm and Haas Electronic Materials L.L.C.
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20110033801
- Publication date Feb 10, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Anthony Zampini
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20110033800
- Publication date Feb 10, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Anthony ZAMPINI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating compositions for photolithography
- Publication number 20080073754
- Publication date Mar 27, 2008
- Rohm and Haas Electronic Materials L.L.C.
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating compositions for photolithography
- Publication number 20070238052
- Publication date Oct 11, 2007
- Rohm and Haas Electronic Materials L.L.C.
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Owendi Ongayi

Person

Patents Grantslast 30 patents

Coating compositions for photolithography

Coating compositions for use with an overcoated photoresist

Coating compositions for use with an overcoated photoresist

Coating compositions for photolithography

Photoacid-generating copolymer and associated photoresist compositi...

Polymer composition, photoresist comprising the polymer composition...

Coating compositions for photolithography

Coating compositions for use with an overcoated photoresist

Photoacid-generating copolymer and associated photoresist compositi...

Photosensitive copolymer, photoresist comprising the copolymer, and...

Photosensitive copolymer, photoresist comprising the copolymer, and...

Copolymer with acid-labile group, photoresist composition, coated s...

Coating compositions for use with an overcoated photoresist

Photoacid generators

Polymerizable photoacid generators

Photosensitive copolymer and photoresist composition

Coating compositions for use with an overcoated photoresist

Coating compositions for photolithography

Patents Applicationslast 30 patents

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...

PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...

COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED S...

PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND...

COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

POLYMER COMPOSITION, PHOTORESIST COMPRISING THE POLYMER COMPOSITION...

PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND...

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

POLYMERIZABLE PHOTOACID GENERATORS

PHOTOACID GENERATORS

PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

Coating compositions for photolithography

Coating compositions for photolithography