Pablo Rovira

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Variable aperture mask
- Patent number 11,268,901
- Issue date Mar 8, 2022
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Grant
Variable aperture mask
- Patent number 10,663,392
- Issue date May 26, 2020
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of small box size targets
- Patent number 10,139,352
- Issue date Nov 27, 2018
- KLA-Tenor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Automated system check for metrology unit
- Patent number 8,825,444
- Issue date Sep 2, 2014
- Nanometrics Incorporated
- Pablo I. Rovira
- G05 - CONTROLLING REGULATING
Information Patent Grant
Spectrometer measurement of diffracting structures
- Patent number 7,372,565
- Issue date May 13, 2008
- Nanometrics Incorporated
- James M. Holden
- G01 - MEASURING TESTING
Information Patent Grant
Eddy current sensor with concentric confocal distance sensor
- Patent number 7,173,417
- Issue date Feb 6, 2007
- Nanometrics Incorporated
- Jaime Poris
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for the measurement of diffracting structures
- Patent number 7,115,858
- Issue date Oct 3, 2006
- Nanometrics Incorporated
- James M. Holden
- G01 - MEASURING TESTING
Information Patent Grant
Pulsed spectroscopy with spatially variable polarization modulation...
- Patent number 7,064,828
- Issue date Jun 20, 2006
- Nanometrics Incorporated
- Pablo I. Rovira
- G01 - MEASURING TESTING
Information Patent Grant
Polarizing beam splitter and dual detector calibration of metrology...
- Patent number 7,061,613
- Issue date Jun 13, 2006
- Nanometrics Incorporated
- Chunsheng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology system with combined interferometer and ellipsometer
- Patent number 6,856,384
- Issue date Feb 15, 2005
- Nanometrics Incorporated
- Pablo I. Rovira
- G01 - MEASURING TESTING
Information Patent Grant
Combination of normal and oblique incidence polarimetry for the cha...
- Patent number 6,713,753
- Issue date Mar 30, 2004
- Nanometrics Incorporated
- Pablo I. Rovira
- G01 - MEASURING TESTING
Information Patent Grant
Alignment of a rotatable polarizer with a sample
- Patent number 6,665,070
- Issue date Dec 16, 2003
- Nanometrics Incorporated
- Richard A. Yarussi
- G01 - MEASURING TESTING
Information Patent Grant
Correcting the system polarization sensitivity of a metrology tool...
- Patent number 6,522,406
- Issue date Feb 18, 2003
- Nanometrics Incorporated
- Pablo I. Rovira
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Variable Aperture Mask
- Publication number 20200271569
- Publication date Aug 27, 2020
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Application
Loosely-Coupled Inspection and Metrology System for High-Volume Pro...
- Publication number 20200184372
- Publication date Jun 11, 2020
- KLA-Tencor Corporation
- Song Wu
- G01 - MEASURING TESTING
Information Patent Application
Variable Aperture Mask
- Publication number 20190049365
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- Barry Blasenheim
- G02 - OPTICS
Information Patent Application
Measurement Of Small Box Size Targets
- Publication number 20160109375
- Publication date Apr 21, 2016
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING

Pablo Rovira

Person

Patents Grantslast 30 patents

Variable aperture mask

Variable aperture mask

Measurement of small box size targets

Automated system check for metrology unit

Spectrometer measurement of diffracting structures

Eddy current sensor with concentric confocal distance sensor

Apparatus and method for the measurement of diffracting structures

Pulsed spectroscopy with spatially variable polarization modulation...

Polarizing beam splitter and dual detector calibration of metrology...

Optical metrology system with combined interferometer and ellipsometer

Combination of normal and oblique incidence polarimetry for the cha...

Alignment of a rotatable polarizer with a sample

Correcting the system polarization sensitivity of a metrology tool...

Patents Applicationslast 30 patents

Variable Aperture Mask

Loosely-Coupled Inspection and Metrology System for High-Volume Pro...

Variable Aperture Mask

Measurement Of Small Box Size Targets