Padmanabhan Krishnaraj

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,799,698
- Issue date Sep 21, 2010
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system for improved transient phase deposition
- Patent number 7,722,737
- Issue date May 25, 2010
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,691,753
- Issue date Apr 6, 2010
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for semiconductor processing
- Patent number 7,498,268
- Issue date Mar 3, 2009
- Applied Materials, Inc.
- Sudhir Gondhalekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distributor having directed gas flow and cleaning method
- Patent number 7,431,772
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Laxman Murugesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In situ application of etch back for improved deposition into high-...
- Patent number 7,399,707
- Issue date Jul 15, 2008
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sequential gas flow oxide deposition technique
- Patent number 7,399,388
- Issue date Jul 15, 2008
- Applied Materials, Inc.
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide...
- Patent number 7,189,639
- Issue date Mar 13, 2007
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for semiconductor processing
- Patent number 7,141,138
- Issue date Nov 28, 2006
- Applied Materials, Inc.
- Sudhir Gondhalekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition process for high aspect ratio trenches
- Patent number 7,097,886
- Issue date Aug 29, 2006
- Applied Materials, Inc.
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,081,414
- Issue date Jul 25, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high aspect ratio HDP CVD gapfill
- Patent number 7,064,077
- Issue date Jun 20, 2006
- Applied Materials
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HDP-CVD uniformity control
- Patent number 6,890,597
- Issue date May 10, 2005
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In situ application of etch back for improved deposition into high-...
- Patent number 6,869,880
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device fabrication chamber cleaning method and appara...
- Patent number 6,863,019
- Issue date Mar 8, 2005
- Applied Materials, Inc.
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for high aspect ratio HDP CVD gapfill
- Patent number 6,812,153
- Issue date Nov 2, 2004
- Applied Materials Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for cleaning a semiconductor wafer processing...
- Patent number 6,715,496
- Issue date Apr 6, 2004
- Applied Materials Inc.
- Michael Chiu Kwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for detecting an end point of chamber cleaning...
- Patent number 6,635,144
- Issue date Oct 21, 2003
- Applied Materials, Inc.
- Zhenjiang Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Patent number 6,633,076
- Issue date Oct 14, 2003
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for cleaning a semiconductor wafer processing...
- Patent number 6,596,123
- Issue date Jul 22, 2003
- Applied Materials, Inc.
- Michael Chiu Kwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Patent number 6,511,922
- Issue date Jan 28, 2003
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,486,081
- Issue date Nov 26, 2002
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma cleaning method for processing chambers
- Patent number 6,274,058
- Issue date Aug 14, 2001
- Applied Materials, Inc.
- Ravi Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kit
- Patent number 6,189,483
- Issue date Feb 20, 2001
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck and method for fabricating the same
- Patent number 6,175,485
- Issue date Jan 16, 2001
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,143,078
- Issue date Nov 7, 2000
- Applied Materials, Inc.
- Tetsuya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Gas Distribution System for Improved Transient Phase Deposition
- Publication number 20080041821
- Publication date Feb 21, 2008
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY SYSTEM FOR SEMICONDUCTOR PROCESSING
- Publication number 20070048446
- Publication date Mar 1, 2007
- Applied Materials, Inc.
- Sudhir Gondhalekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...
- Publication number 20060286764
- Publication date Dec 21, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...
- Publication number 20060228886
- Publication date Oct 12, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide...
- Publication number 20060178003
- Publication date Aug 10, 2006
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas distribution system for improved transient phase deposition
- Publication number 20060113038
- Publication date Jun 1, 2006
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of low dielectric constant films by N2O addition
- Publication number 20050214457
- Publication date Sep 29, 2005
- APPLIED MATERIALS, INC.
- Francimar Schmitt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas distributor having directed gas flow and cleaning method
- Publication number 20050199184
- Publication date Sep 15, 2005
- APPLIED MATERIALS, INC.
- Laxman Murugesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In situ application of etch back for improved deposition into high-...
- Publication number 20050124166
- Publication date Jun 9, 2005
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for high aspect ratio HDP CVD gapfill
- Publication number 20050079715
- Publication date Apr 14, 2005
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sequential gas flow oxide deposition technique
- Publication number 20050019494
- Publication date Jan 27, 2005
- APPLIED MATERIALS, INC., A Delaware corporation
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
[DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM G...
- Publication number 20040251236
- Publication date Dec 16, 2004
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas delivery system for semiconductor processing
- Publication number 20040231798
- Publication date Nov 25, 2004
- APPLIED MATERIALS, INC.
- Sudhir Gondhalekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HDP-CVD uniformity control
- Publication number 20040224090
- Publication date Nov 11, 2004
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas delivery system for semiconductor processing
- Publication number 20040126952
- Publication date Jul 1, 2004
- Applied Materials, Inc.
- Sudhir Gondhalekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition process for high aspect ratio trenches
- Publication number 20040115898
- Publication date Jun 17, 2004
- Applied Materials, Inc.
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for high aspect ratio HDP CVD gapfill
- Publication number 20030203637
- Publication date Oct 30, 2003
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for cleaning a semiconductor wafer processing...
- Publication number 20030164224
- Publication date Sep 4, 2003
- Michael Chiu Kwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In situ application of etch back for improved deposition into high-...
- Publication number 20030136332
- Publication date Jul 24, 2003
- APPLIED MATERIALS INC., a Delaware corporation
- Padmanabhan Krishnaraj
- C30 - CRYSTAL GROWTH
Information Patent Application
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Publication number 20030064556
- Publication date Apr 3, 2003
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device fabrication chamber cleaning method and appara...
- Publication number 20030036272
- Publication date Feb 20, 2003
- APPLIED MATERIALS, INC.
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Publication number 20020173167
- Publication date Nov 21, 2002
- APPLIED MATERIALS, INC.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for detecting an end point of chamber cleaning...
- Publication number 20020151186
- Publication date Oct 17, 2002
- Zhenjiang Cui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Padmanabhan Krishnaraj

Person

Patents Grantslast 30 patents

Deposition-selective etch-deposition process for dielectric film ga...

Gas distribution system for improved transient phase deposition

Deposition-selective etch-deposition process for dielectric film ga...

Gas delivery system for semiconductor processing

Gas distributor having directed gas flow and cleaning method

In situ application of etch back for improved deposition into high-...

Sequential gas flow oxide deposition technique

Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide...

Gas delivery system for semiconductor processing

Deposition process for high aspect ratio trenches

Deposition-selective etch-deposition process for dielectric film ga...

Method for high aspect ratio HDP CVD gapfill

HDP-CVD uniformity control

In situ application of etch back for improved deposition into high-...

Semiconductor device fabrication chamber cleaning method and appara...

Method for high aspect ratio HDP CVD gapfill

Method and apparatus for cleaning a semiconductor wafer processing...

Apparatus and method for detecting an end point of chamber cleaning...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Method and apparatus for cleaning a semiconductor wafer processing...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Gas distribution system for a CVD processing chamber

Remote plasma cleaning method for processing chambers

Process kit

Electrostatic chuck and method for fabricating the same

Gas distribution system for a CVD processing chamber

Patents Applicationslast 30 patents

Gas Distribution System for Improved Transient Phase Deposition

GAS DELIVERY SYSTEM FOR SEMICONDUCTOR PROCESSING

DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...

DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...

Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide...

Gas distribution system for improved transient phase deposition

Deposition of low dielectric constant films by N2O addition

Gas distributor having directed gas flow and cleaning method

In situ application of etch back for improved deposition into high-...

Method for high aspect ratio HDP CVD gapfill

Sequential gas flow oxide deposition technique

[DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM G...

Gas delivery system for semiconductor processing

HDP-CVD uniformity control

Gas delivery system for semiconductor processing

Deposition process for high aspect ratio trenches

Method for high aspect ratio HDP CVD gapfill

Method and apparatus for cleaning a semiconductor wafer processing...

In situ application of etch back for improved deposition into high-...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Semiconductor device fabrication chamber cleaning method and appara...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Apparatus and method for detecting an end point of chamber cleaning...