Parham Yaghoobi

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic system provided with a deflection apparatus for changi...
- Patent number 12,332,570
- Issue date Jun 17, 2025
- ASML Holding N.V.
- Ronald Peter Albright
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT
- Publication number 20240385541
- Publication date Nov 21, 2024
- Carl Zeiss SMT GMBH
- Wilbert KRUITHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING A RETICLE AND PELLICLE ASSEMBLY
- Publication number 20230314930
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...
- Publication number 20230063156
- Publication date Mar 2, 2023
- ASML Holding N.V.
- Ronald Peter ALBRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Parham Yaghoobi

Person

Patents Grantslast 30 patents

Lithographic system provided with a deflection apparatus for changi...

Prolonging optical element lifetime in an EUV lithography system

Prolonging optical element lifetime in an EUV lithography system

Patents Applicationslast 30 patents

EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

APPARATUS AND METHOD FOR PROCESSING A RETICLE AND PELLICLE ASSEMBLY

LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM