Pary Baluswamy

Person

Bristow, VA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical compensation devices, systems, and methods
- Patent number 8,323,859
- Issue date Dec 4, 2012
- Micron Technology, Inc.
- Xinya Lei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical compensation devices, systems, and methods
- Patent number 8,062,814
- Issue date Nov 22, 2011
- Micron Technology, Inc.
- Xinya Lei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for photo-processing photo-imageable material
- Patent number 7,862,964
- Issue date Jan 4, 2011
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical compensation devices, systems, and methods
- Patent number 7,790,338
- Issue date Sep 7, 2010
- Micron Technology, Inc.
- Xinya Lei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for photo-processing photo-imageable material
- Patent number 7,767,363
- Issue date Aug 3, 2010
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for reducing spherical aberration effects in photolithography
- Patent number 7,655,384
- Issue date Feb 2, 2010
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ spectrograph and method of measuring light wavelength chara...
- Patent number 7,268,869
- Issue date Sep 11, 2007
- Micron Technology, Inc.
- Pary Baluswamy
- G01 - MEASURING TESTING
Information Patent Grant
Methods for forming backside alignment markers useable in semicondu...
- Patent number 7,223,674
- Issue date May 29, 2007
- Micron Technology, Inc.
- Pary Baluswamy
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pattern mask with features to minimize the effect of aberrations
- Patent number 7,105,278
- Issue date Sep 12, 2006
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Residue free overlay target
- Patent number 6,914,017
- Issue date Jul 5, 2005
- Micron Technology, Inc.
- Pary Baluswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Raised-lines overlay semiconductor targets and method of making the...
- Patent number 6,822,342
- Issue date Nov 23, 2004
- Micron Technology, Inc.
- Pary Baluswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern mask with features to minimize the effect of aberrations
- Patent number 6,803,157
- Issue date Oct 12, 2004
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay target design method to minimize impact of lens aberrations
- Patent number 6,756,167
- Issue date Jun 29, 2004
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout for measurement of overlay error
- Patent number 6,675,053
- Issue date Jan 6, 2004
- Micron Technology, Inc.
- Pary Baluswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target exposure device utilizing pitch determination to min...
- Patent number 6,514,643
- Issue date Feb 4, 2003
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout for measurement of overlay error
- Patent number 6,484,060
- Issue date Nov 19, 2002
- Micron Technology, Inc.
- Pary Baluswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design method with pitch determination to minimize i...
- Patent number 6,432,591
- Issue date Aug 13, 2002
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL COMPENSATION DEVICES, SYSTEMS, AND METHODS
- Publication number 20120064439
- Publication date Mar 15, 2012
- Xinya Lei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPENSATION DEVICES, SYSTEMS, AND METHODS
- Publication number 20100323283
- Publication date Dec 23, 2010
- Xinya Lei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods For Photo-Processing Photo-Imageable Material
- Publication number 20100261107
- Publication date Oct 14, 2010
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPENSATION DEVICES, SYSTEMS, AND METHODS
- Publication number 20080284996
- Publication date Nov 20, 2008
- Micron Technology, Inc.
- Xinya Lei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for reducing spherical aberration effects in photolithography
- Publication number 20070002312
- Publication date Jan 4, 2007
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle constructions, and methods for photo-processing photo-image...
- Publication number 20060292456
- Publication date Dec 28, 2006
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for forming backside alignment markers useable in semicondu...
- Publication number 20060226118
- Publication date Oct 12, 2006
- Pary Baluswamy
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Pattern mask with features to minimize the effect of aberrations
- Publication number 20060093927
- Publication date May 4, 2006
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
In-situ spectrograph and method of measuring light wavelength chara...
- Publication number 20060033912
- Publication date Feb 16, 2006
- Pary Baluswamy
- G01 - MEASURING TESTING
Information Patent Application
Raised-lines overlay semiconductor targets and method of making the...
- Publication number 20060017074
- Publication date Jan 26, 2006
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for forming backside alignment markers useable in semicondu...
- Publication number 20050250292
- Publication date Nov 10, 2005
- Pary Baluswamy
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Methods for clearing alignment markers useable in semiconductor lit...
- Publication number 20050250291
- Publication date Nov 10, 2005
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Raised-lines overlay semiconductor targets and method of making the...
- Publication number 20050070069
- Publication date Mar 31, 2005
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for reducing spherical aberration effects in photolithography
- Publication number 20050048412
- Publication date Mar 3, 2005
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern mask with features to minimize the effect of aberrations
- Publication number 20050003281
- Publication date Jan 6, 2005
- MICRON TECHNOLOGY, INC. a corporation of Delaware
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern mask with features to minimize the effect of aberrations
- Publication number 20030165748
- Publication date Sep 4, 2003
- MICRON TECHNOLOGY INC., a corporation of Delaware
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay target design method minimize impact of lens aberrations
- Publication number 20030091916
- Publication date May 15, 2003
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Layout for measurement of overlay error
- Publication number 20030027368
- Publication date Feb 6, 2003
- Pary Baluswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Overlay target design method to minimize impact of lens aberrations
- Publication number 20020160284
- Publication date Oct 31, 2002
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Residue-free overlay target
- Publication number 20020036332
- Publication date Mar 28, 2002
- Pary Baluswamy
- H01 - BASIC ELECTRIC ELEMENTS

Pary Baluswamy

Person

Patents Grantslast 30 patents

Optical compensation devices, systems, and methods

Optical compensation devices, systems, and methods

Methods for photo-processing photo-imageable material

Optical compensation devices, systems, and methods

Methods for photo-processing photo-imageable material

Methods for reducing spherical aberration effects in photolithography

In-situ spectrograph and method of measuring light wavelength chara...

Methods for forming backside alignment markers useable in semicondu...

Pattern mask with features to minimize the effect of aberrations

Residue free overlay target

Raised-lines overlay semiconductor targets and method of making the...

Pattern mask with features to minimize the effect of aberrations

Overlay target design method to minimize impact of lens aberrations

Layout for measurement of overlay error

Overlay target exposure device utilizing pitch determination to min...

Layout for measurement of overlay error

Overlay target design method with pitch determination to minimize i...

Patents Applicationslast 30 patents

OPTICAL COMPENSATION DEVICES, SYSTEMS, AND METHODS

OPTICAL COMPENSATION DEVICES, SYSTEMS, AND METHODS

Methods For Photo-Processing Photo-Imageable Material

OPTICAL COMPENSATION DEVICES, SYSTEMS, AND METHODS

Methods for reducing spherical aberration effects in photolithography

Reticle constructions, and methods for photo-processing photo-image...

Methods for forming backside alignment markers useable in semicondu...

Pattern mask with features to minimize the effect of aberrations

In-situ spectrograph and method of measuring light wavelength chara...

Raised-lines overlay semiconductor targets and method of making the...

Methods for forming backside alignment markers useable in semicondu...

Methods for clearing alignment markers useable in semiconductor lit...

Raised-lines overlay semiconductor targets and method of making the...

Methods for reducing spherical aberration effects in photolithography

Pattern mask with features to minimize the effect of aberrations

Pattern mask with features to minimize the effect of aberrations

Overlay target design method minimize impact of lens aberrations

Layout for measurement of overlay error

Overlay target design method to minimize impact of lens aberrations

Residue-free overlay target