PATRICIA M. LIU

Person

SARATOGA, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Temperature profile measurement and synchronized control on substra...
- Patent number 12,196,617
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Zuoming Zhu
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing monitoring
- Patent number 12,165,934
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zuoming Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicide film nucleation
- Patent number 11,901,182
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for foreline deposition diagnostics and control
- Patent number 11,860,973
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Ala Moradian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods, systems, and apparatus for conducting a calibration operat...
- Patent number 11,733,081
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Bindusagar Marath Sankarathodi
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for metal silicide deposition
- Patent number 11,615,986
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate interface engineering with doped layer
- Patent number 11,456,178
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated CMOS source drain formation with advanced control
- Patent number 11,309,404
- Issue date Apr 19, 2022
- Applied Materials, Inc.
- Benjamin Colombeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cap oxidation for FinFET formation
- Patent number 11,271,097
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Steven C. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ temperature mapping for epi chamber
- Patent number 11,261,538
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Ala Moradian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device having reduced contact...
- Patent number 11,195,923
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Gaurav Thareja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor and method for forming a transistor
- Patent number 11,195,914
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Patricia M. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, method of making a semiconductor device, and...
- Patent number 11,152,479
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Gaurav Thareja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for metal silicide deposition
- Patent number 11,152,221
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicide film nucleation
- Patent number 11,081,358
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ integrated chambers
- Patent number 11,037,838
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for silicide deposition
- Patent number 10,971,366
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Xuebin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 10,872,763
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated semiconductor processing
- Patent number 10,861,722
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- Benjamin Colombeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Engineering induced tunable electrostatic effect
- Patent number 9,437,640
- Issue date Sep 6, 2016
- Applied Materials, Inc.
- Sherry Mings
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NMOS metal gate materials, manufacturing methods, and equipment usi...
- Patent number 9,048,183
- Issue date Jun 2, 2015
- Applied Materials, Inc.
- Seshadri Ganguli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In situ vapor phase surface activation of SiO2
- Patent number 8,778,816
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 8,658,522
- Issue date Feb 25, 2014
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
NMOS metal gate materials, manufacturing methods, and equipment usi...
- Patent number 8,642,468
- Issue date Feb 4, 2014
- Applied Materials, Inc.
- Seshadri Ganguli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 8,375,892
- Issue date Feb 19, 2013
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 7,913,645
- Issue date Mar 29, 2011
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and apparatus for incorporating nitrogen in oxide films
- Patent number 7,902,050
- Issue date Mar 8, 2011
- Applied Materials, Inc.
- Tatsuya Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of fabricating a high dielectric constant transistor gate us...
- Patent number 7,837,838
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for fabricating a high dielectric constant tra...
- Patent number 7,678,710
- Issue date Mar 16, 2010
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for fabricating a high dielectric constant tra...
- Patent number 7,645,710
- Issue date Jan 12, 2010
- Applied Materials, Inc.
- Christopher Sean Olsen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A CALIBRATION OPERAT...
- Publication number 20230366715
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Bindusagar MARATH SANKARATHODI
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF FORMATION OF A SIGE/SI SUPERLATTICE
- Publication number 20230029344
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- John TOLLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED STRAIN Si/SiGe HETEROEPITAXY STACKS FOR 3D DRAM
- Publication number 20230012819
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- John Byron Tolle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A CALIBRATION OPERAT...
- Publication number 20220326061
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Bindusagar MARATH SANKARATHODI
- G01 - MEASURING TESTING
Information Patent Application
LEVEL MONITORING AND ACTIVE ADJUSTMENT OF A SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20220316066
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- James V. SANTIAGO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARSENIC DIFFUSION PROFILE ENGINEERING FOR TRANSISTORS
- Publication number 20220320294
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Patricia M. LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DETECTION USING OPTICAL EMISSION SPECTROSCOPY
- Publication number 20220283029
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Zuoming ZHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated CMOS Source Drain Formation With Advanced Control
- Publication number 20220199804
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Benjamin Colombeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE PROFILE MEASUREMENT AND SYNCHRONIZED CONTROL ON SUBSTRA...
- Publication number 20220155148
- Publication date May 19, 2022
- Applied Materials, Inc.
- Zuoming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORELINE DEPOSITION DIAGNOSTICS AND CONTROL
- Publication number 20220129698
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Ala MORADIAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FABRICATING A SEMICONDUCTOR DEVICE HAVING REDUCED CONTACT...
- Publication number 20220093749
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Gaurav THAREJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU TEMPERATURE MAPPING FOR EPI CHAMBER
- Publication number 20220090293
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Ala MORADIAN
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICIDE FILM NUCLEATION
- Publication number 20220033970
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Xuebi LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION
- Publication number 20220005705
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION
- Publication number 20220005704
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE INTERFACE ENGINEERING WITH DOPED LAYER
- Publication number 20210398814
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAP OXIDATION FOR FINFET FORMATION
- Publication number 20210134986
- Publication date May 6, 2021
- Applied Materials, Inc.
- Steven C. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR AND METHOD FOR FORMING A TRANSISTOR
- Publication number 20210028280
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Patricia M. LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING MONITORING
- Publication number 20210028075
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Zuoming ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20200350157
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION
- Publication number 20200266068
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, METHOD OF MAKING A SEMICONDUCTOR DEVICE, AND...
- Publication number 20200258997
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Gaurav THAREJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A SEMICONDUCTOR DEVICE HAVING REDUCED CONTACT...
- Publication number 20200203490
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Gaurav THAREJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SEMICONDUCTOR PROCESSING
- Publication number 20200152493
- Publication date May 14, 2020
- Applied Materials, Inc.
- Benjamin COLOMBEAU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU INTEGRATED CHAMBERS
- Publication number 20200091010
- Publication date Mar 19, 2020
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated CMOS Source Drain Formation With Advanced Control
- Publication number 20200013878
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Benjamin Colombeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICIDE FILM NUCLEATION
- Publication number 20200013624
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SILICIDE DEPOSITION
- Publication number 20200013625
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Xuebin LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Injector For Spatially Separated Atomic Layer Deposition Chamber
- Publication number 20160215392
- Publication date Jul 28, 2016
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Engineering Induced Tunable Electrostatic Effect
- Publication number 20150069476
- Publication date Mar 12, 2015
- Sherry Mings
- H01 - BASIC ELECTRIC ELEMENTS

PATRICIA M. LIU

Person

Patents Grantslast 30 patents

Temperature profile measurement and synchronized control on substra...

Substrate processing monitoring

Silicide film nucleation

Method and system for foreline deposition diagnostics and control

Methods, systems, and apparatus for conducting a calibration operat...

Methods and apparatus for metal silicide deposition

Gate interface engineering with doped layer

Integrated CMOS source drain formation with advanced control

Cap oxidation for FinFET formation

In-situ temperature mapping for epi chamber

Method of fabricating a semiconductor device having reduced contact...

Transistor and method for forming a transistor

Semiconductor device, method of making a semiconductor device, and...

Methods and apparatus for metal silicide deposition

Silicide film nucleation

In-situ integrated chambers

Methods for silicide deposition

Treatments to enhance material structures

Integrated semiconductor processing

Engineering induced tunable electrostatic effect

NMOS metal gate materials, manufacturing methods, and equipment usi...

In situ vapor phase surface activation of SiO2

Methods and apparatus for incorporating nitrogen in oxide films

NMOS metal gate materials, manufacturing methods, and equipment usi...

Methods and apparatus for incorporating nitrogen in oxide films

Methods and apparatus for incorporating nitrogen in oxide films

Methods and apparatus for incorporating nitrogen in oxide films

Method of fabricating a high dielectric constant transistor gate us...

Method and apparatus for fabricating a high dielectric constant tra...

Method and apparatus for fabricating a high dielectric constant tra...

Patents Applicationslast 30 patents

METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A CALIBRATION OPERAT...

METHODS OF FORMATION OF A SIGE/SI SUPERLATTICE

REDUCED STRAIN Si/SiGe HETEROEPITAXY STACKS FOR 3D DRAM

METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A CALIBRATION OPERAT...

LEVEL MONITORING AND ACTIVE ADJUSTMENT OF A SUBSTRATE SUPPORT ASSEMBLY

ARSENIC DIFFUSION PROFILE ENGINEERING FOR TRANSISTORS

METHODS FOR DETECTION USING OPTICAL EMISSION SPECTROSCOPY

Integrated CMOS Source Drain Formation With Advanced Control

TEMPERATURE PROFILE MEASUREMENT AND SYNCHRONIZED CONTROL ON SUBSTRA...

METHOD AND SYSTEM FOR FORELINE DEPOSITION DIAGNOSTICS AND CONTROL

METHOD OF FABRICATING A SEMICONDUCTOR DEVICE HAVING REDUCED CONTACT...

IN-SITU TEMPERATURE MAPPING FOR EPI CHAMBER

SILICIDE FILM NUCLEATION

METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION

METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION

GATE INTERFACE ENGINEERING WITH DOPED LAYER

CAP OXIDATION FOR FINFET FORMATION

TRANSISTOR AND METHOD FOR FORMING A TRANSISTOR

SUBSTRATE PROCESSING MONITORING

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

METHODS AND APPARATUS FOR METAL SILICIDE DEPOSITION

SEMICONDUCTOR DEVICE, METHOD OF MAKING A SEMICONDUCTOR DEVICE, AND...

METHOD OF FABRICATING A SEMICONDUCTOR DEVICE HAVING REDUCED CONTACT...

INTEGRATED SEMICONDUCTOR PROCESSING

IN-SITU INTEGRATED CHAMBERS

Integrated CMOS Source Drain Formation With Advanced Control

SILICIDE FILM NUCLEATION

METHODS FOR SILICIDE DEPOSITION

Injector For Spatially Separated Atomic Layer Deposition Chamber

Engineering Induced Tunable Electrostatic Effect