Patricius Aloysius Jacobus Tinnemans

Person

Hapert, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,112,260
- Issue date Oct 8, 2024
- ASML Netherlands B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,066,764
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,709,436
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,650,047
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 11,415,900
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method involving a...
- Patent number 11,378,893
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Theodorus Petrus Maria Cadee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining deformation
- Patent number 11,181,836
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,125,806
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Computational metrology
- Patent number 11,067,902
- Issue date Jul 20, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor, lithographic apparatus, and device manufacturing method
- Patent number 11,022,902
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,009,343
- Issue date May 18, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,901,326
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method involving a...
- Patent number 10,838,310
- Issue date Nov 17, 2020
- ASML Netherlands B.V.
- Theodorus Petrus Maria Cadee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 10,816,909
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,620,549
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system
- Patent number 10,585,363
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,527,955
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,474,045
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment sensor for lithographic apparatus
- Patent number 10,466,601
- Issue date Nov 5, 2019
- ASML Netherlands B.V.
- Alessandro Polo
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus alignment sensor and method
- Patent number 10,386,735
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for converting a vector-based representation o...
- Patent number 10,346,729
- Issue date Jul 9, 2019
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,331,040
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination source for an inspection apparatus, inspection apparat...
- Patent number 10,267,744
- Issue date Apr 23, 2019
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 10,261,423
- Issue date Apr 16, 2019
- ASML Netherlands B.V.
- Lense Hendrik-Jan Maria Swaenen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method involving a...
- Patent number 10,254,663
- Issue date Apr 9, 2019
- ASML Netherlands B.V.
- Theodorus Petrus Maria Cadee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,248,033
- Issue date Apr 2, 2019
- ASML Netherlands B.V.
- Jeroen Johannes Sophia Maria Mertens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240210844
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
- Publication number 20240027918
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20230273255
- Publication date Aug 31, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING A SAMPLING SCHEME, ASSOCIATED APPARATUS AND C...
- Publication number 20230141495
- Publication date May 11, 2023
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A...
- Publication number 20230064193
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology System and Method for Determining a Characteristic of One...
- Publication number 20230062585
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20230017491
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS
- Publication number 20220350260
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Armand Eugene Albert
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20210389365
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210349395
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING DEFORMATION
- Publication number 20210149316
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sensor, Lithographic Apparatus, and Device Manufacturing Method
- Publication number 20210072647
- Publication date Mar 11, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...
- Publication number 20210063898
- Publication date Mar 4, 2021
- ASML NETHERLANDS B.V.
- Theodorus Petrus Maria CADEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method For Determining a Characteristic of one...
- Publication number 20210003924
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200272061
- Publication date Aug 27, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20200249576
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...
- Publication number 20200201194
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20200041563
- Publication date Feb 6, 2020
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20190378012
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...
- Publication number 20190265598
- Publication date Aug 29, 2019
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20190265028
- Publication date Aug 29, 2019
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...
- Publication number 20190235397
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Theodorus Petrus Maria CADEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190227444
- Publication date Jul 25, 2019
- ASML NETHERLANDS B.V.
- Christiaan Alexander HOOGENDAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method For Determining a Characteristic of One...
- Publication number 20190107781
- Publication date Apr 11, 2019
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS
- Publication number 20180329316
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Alessandro POLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus Alignment Sensor and Method
- Publication number 20180246423
- Publication date Aug 30, 2018
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180231900
- Publication date Aug 16, 2018
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patricius Aloysius Jacobus Tinnemans

Person

Patents Grantslast 30 patents

Metrology apparatus and method for determining a characteristic of...

Metrology apparatus and method for determining a characteristic of...

Metrology system and method for determining a characteristic of one...

Metrology apparatus and method for determining a characteristic of...

Metrology apparatus and method for determining a characteristic of...

Metrology system and method for determining a characteristic of one...

Lithographic apparatus and device manufacturing method involving a...

Method for determining deformation

Metrology apparatus and method for determining a characteristic of...

Computational metrology

Lithographic method

Sensor, lithographic apparatus, and device manufacturing method

Metrology apparatus and method for determining a characteristic of...

Lithographic method

Method of controlling a lithographic apparatus and device manufactu...

Lithographic apparatus and device manufacturing method involving a...

Metrology system and method for determining a characteristic of one...

Method of controlling a lithographic apparatus and device manufactu...

Alignment system

Lithographic method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Alignment sensor for lithographic apparatus

Lithographic apparatus alignment sensor and method

Apparatus and method for converting a vector-based representation o...

Method of controlling a lithographic apparatus and device manufactu...

Illumination source for an inspection apparatus, inspection apparat...

Lithographic method and apparatus

Lithographic apparatus and device manufacturing method involving a...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

METHOD OF DETERMINING A SAMPLING SCHEME, ASSOCIATED APPARATUS AND C...

METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A...

Metrology System and Method for Determining a Characteristic of One...

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

COMPUTATIONAL METROLOGY

METHOD FOR DETERMINING DEFORMATION

Sensor, Lithographic Apparatus, and Device Manufacturing Method

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...

Metrology System and Method For Determining a Characteristic of one...

LITHOGRAPHIC METHOD

COMPUTATIONAL METROLOGY

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...

LITHOGRAPHIC METHOD

Metrology Apparatus and Method for Determining a Characteristic of...

Metrology Apparatus and Method for Determining a Characteristic of...

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...

Metrology Apparatus and Method for Determining a Characteristic of...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Metrology System and Method For Determining a Characteristic of One...

LITHOGRAPHIC METHOD

ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS

Lithographic Apparatus Alignment Sensor and Method

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD