Patricius Aloysius Jacobus Tinnemans

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Hapert, NL

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Patents Applicationslast 30 patents

Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060139600
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and device for alignment of a substrate
- Publication number 20050140960
- Publication date Jun 30, 2005
- ASML NETHERLANDS B.V.
- Johannes Martinus Andreas Hazenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY