Patrick Foster

Person

Providence, RI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Hydroxy-amino thermally cured undercoat for 193 nm lithography
- Patent number 7,217,497
- Issue date May 15, 2007
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive bilayer composition
- Patent number 6,929,897
- Issue date Aug 16, 2005
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermally cured underlayer for lithographic application
- Patent number 6,924,339
- Issue date Aug 2, 2005
- Arch Specialty Chemicals, Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hydroxy-amino thermally cured undercoat of 193 nm lithography
- Patent number 6,783,916
- Issue date Aug 31, 2004
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermally cured underlayer for lithographic application
- Patent number 6,610,808
- Issue date Aug 26, 2003
- Arch Specialty Chemicals, Inc.
- Binod B. De
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hydroxy-epoxide thermally cured undercoat for 193 NM lithography
- Patent number 6,492,092
- Issue date Dec 10, 2002
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hydroxy-amino thermally cured undercoat for 193 NM lithography
- Patent number 6,323,287
- Issue date Nov 27, 2001
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Radiation sensitive copolymers, photoresist compositions thereof an...
- Patent number 6,165,682
- Issue date Dec 26, 2000
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography
- Patent number 6,054,248
- Issue date Apr 25, 2000
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Novel photosensitive bilayer composition
- Publication number 20050042542
- Publication date Feb 24, 2005
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Hydroxy-amino thermally cured undercoat for 193 NM lithography
- Publication number 20040219454
- Publication date Nov 4, 2004
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Thermally cured underlayer for lithographic application
- Publication number 20030204035
- Publication date Oct 30, 2003
- Arch Specialty Chemicals Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Thermally cured underlayer for lithographic application
- Publication number 20020173594
- Publication date Nov 21, 2002
- Arch Specialty Chemicals, Inc.
- Binod B. De
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Hydroxy-amino thermally cured undercoat for 193 nm lithography
- Publication number 20020007018
- Publication date Jan 17, 2002
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patrick Foster

Person

Patents Grantslast 30 patents

Hydroxy-amino thermally cured undercoat for 193 nm lithography

Photosensitive bilayer composition

Thermally cured underlayer for lithographic application

Hydroxy-amino thermally cured undercoat of 193 nm lithography

Thermally cured underlayer for lithographic application

Hydroxy-epoxide thermally cured undercoat for 193 NM lithography

Hydroxy-amino thermally cured undercoat for 193 NM lithography

Radiation sensitive copolymers, photoresist compositions thereof an...

Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography

Patents Applicationslast 30 patents

Novel photosensitive bilayer composition

Hydroxy-amino thermally cured undercoat for 193 NM lithography

Thermally cured underlayer for lithographic application

Thermally cured underlayer for lithographic application

Hydroxy-amino thermally cured undercoat for 193 nm lithography