Patrick M. Martin

Person

Capitola, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Utilization of angled trench for effective aspect ratio trapping of...
- Patent number 10,026,613
- Issue date Jul 17, 2018
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilization of angled trench for effective aspect ratio trapping of...
- Patent number 9,799,531
- Issue date Oct 24, 2017
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for modifying substrate relief features using ion...
- Patent number 9,767,987
- Issue date Sep 19, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of affecting material properties and applications therefor
- Patent number 9,425,027
- Issue date Aug 23, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Utilization of angled trench for effective aspect ratio trapping of...
- Patent number 9,406,507
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for modifying photoresist using electromagnetic r...
- Patent number 9,340,877
- Issue date May 17, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for modifying resist openings using multiple angl...
- Patent number 8,974,683
- Issue date Mar 10, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques for processing photoresist features using ions
- Patent number 8,952,344
- Issue date Feb 10, 2015
- Varian Semiconductor Equipment Associates
- Frank Sinclair
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques for generating three dimensional structures
- Patent number 8,937,019
- Issue date Jan 20, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. England
- B44 - DECORATIVE ARTS
Information Patent Grant
Method and system for patterning a substrate
- Patent number 8,912,097
- Issue date Dec 16, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Patrick M. Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for modifying substrate relief features using ion...
- Patent number 8,778,603
- Issue date Jul 15, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for controlling critical dimension and roughness...
- Patent number 8,698,109
- Issue date Apr 15, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for post-etch treatment of patterned substrate fe...
- Patent number 8,460,569
- Issue date Jun 11, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for modifying photoresist using electromagnetic r...
- Patent number 8,435,727
- Issue date May 7, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling critical dimension and roughness...
- Patent number 8,354,655
- Issue date Jan 15, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for modifying patterned photoresist using multi-s...
- Patent number 8,133,804
- Issue date Mar 13, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...
- Publication number 20170330750
- Publication date Nov 16, 2017
- Applied Materials, Inc.
- Swaminathan T. SRINIVASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Affecting Material Properties And Applications Therefor
- Publication number 20160326636
- Publication date Nov 10, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UTLIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...
- Publication number 20160307774
- Publication date Oct 20, 2016
- Applied Materials, Inc.
- Swaminathan T. SRINIVASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...
- Publication number 20150311292
- Publication date Oct 29, 2015
- Applied Materials, Inc.
- Swaminathan T. SRINIVASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cyclic Spike Anneal Chemical Exposure For Low Thermal Budget Proces...
- Publication number 20150275364
- Publication date Oct 1, 2015
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Selective Layer Deposition
- Publication number 20150162214
- Publication date Jun 11, 2015
- Applied Materials, Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MODIFYING SUBSTRATE RELIEF FEATURES USING ION...
- Publication number 20140306127
- Publication date Oct 16, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR PROCESSING PHOTORESIST FEATURES USING IONS
- Publication number 20140272728
- Publication date Sep 18, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TECHNIQUES FOR GENERATING THREE DIMENSIONAL STRUCTURES
- Publication number 20130284697
- Publication date Oct 31, 2013
- Jonathan G. England
- B44 - DECORATIVE ARTS
Information Patent Application
METHOD AND SYSTEM FOR MODIFYING PHOTORESIST USING ELECTROMAGNETIC R...
- Publication number 20130247824
- Publication date Sep 26, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...
- Publication number 20130135598
- Publication date May 30, 2013
- VARIAN SEMICONDUCTOR EQUIPMENT ASSCOCIATES, INC.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MODIFYING RESIST OPENINGS USING MULTIPLE ANGL...
- Publication number 20130062309
- Publication date Mar 14, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF AFFECTING MATERIAL PROPERTIES AND APPLICATIONS THEREFOR
- Publication number 20120288637
- Publication date Nov 15, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...
- Publication number 20120280140
- Publication date Nov 8, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR POST-ETCH TREATMENT OF PATTERNED SUBSTRATE FE...
- Publication number 20120258600
- Publication date Oct 11, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION-ASSISTED PLASMA TREATMENT OF A THREE-DIMENSIONAL STRUCTURE
- Publication number 20120213941
- Publication date Aug 23, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Louis Steen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROPHOBIC PROPERTY ALTERATION USING ION IMPLANTATION
- Publication number 20120137971
- Publication date Jun 7, 2012
- VANRIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- Patrick M. MARTIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR MODIFYING PATTERNED PHOTORESIST USING MULTI-S...
- Publication number 20120083136
- Publication date Apr 5, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MODIFYING PHOTORESIST USING ELECTROMAGNETIC R...
- Publication number 20120082942
- Publication date Apr 5, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR PATTERNING A SUBSTRATE
- Publication number 20110300711
- Publication date Dec 8, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Patrick M. Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR MODIFYING SUBSTRATE RELIEF FEATURES USING ION...
- Publication number 20110223546
- Publication date Sep 15, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patrick M. Martin

Person

Patents Grantslast 30 patents

Utilization of angled trench for effective aspect ratio trapping of...

Utilization of angled trench for effective aspect ratio trapping of...

Method and system for modifying substrate relief features using ion...

Methods of affecting material properties and applications therefor

Utilization of angled trench for effective aspect ratio trapping of...

Method and system for modifying photoresist using electromagnetic r...

Method and system for modifying resist openings using multiple angl...

Techniques for processing photoresist features using ions

Techniques for generating three dimensional structures

Method and system for patterning a substrate

Method and system for modifying substrate relief features using ion...

Method and system for controlling critical dimension and roughness...

Method and system for post-etch treatment of patterned substrate fe...

Method and system for modifying photoresist using electromagnetic r...

Method and system for controlling critical dimension and roughness...

Method and system for modifying patterned photoresist using multi-s...

Patents Applicationslast 30 patents

UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...

Methods Of Affecting Material Properties And Applications Therefor

UTLIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...

UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...

Cyclic Spike Anneal Chemical Exposure For Low Thermal Budget Proces...

Methods Of Selective Layer Deposition

METHOD AND SYSTEM FOR MODIFYING SUBSTRATE RELIEF FEATURES USING ION...

TECHNIQUES FOR PROCESSING PHOTORESIST FEATURES USING IONS

TECHNIQUES FOR GENERATING THREE DIMENSIONAL STRUCTURES

METHOD AND SYSTEM FOR MODIFYING PHOTORESIST USING ELECTROMAGNETIC R...

METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...

METHOD AND SYSTEM FOR MODIFYING RESIST OPENINGS USING MULTIPLE ANGL...

METHODS OF AFFECTING MATERIAL PROPERTIES AND APPLICATIONS THEREFOR

METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...

METHOD AND SYSTEM FOR POST-ETCH TREATMENT OF PATTERNED SUBSTRATE FE...

ION-ASSISTED PLASMA TREATMENT OF A THREE-DIMENSIONAL STRUCTURE

HYDROPHOBIC PROPERTY ALTERATION USING ION IMPLANTATION

METHOD AND SYSTEM FOR MODIFYING PATTERNED PHOTORESIST USING MULTI-S...

METHOD AND SYSTEM FOR MODIFYING PHOTORESIST USING ELECTROMAGNETIC R...

METHOD AND SYSTEM FOR PATTERNING A SUBSTRATE

METHOD AND SYSTEM FOR MODIFYING SUBSTRATE RELIEF FEATURES USING ION...