Patrick WARNAAR

Person

Tilburg, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,242,203
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 12,197,136
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,112,260
- Issue date Oct 8, 2024
- ASML Netherlands B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and associated computer product
- Patent number 12,105,432
- Issue date Oct 1, 2024
- ASML Netherlands B.V.
- Narjes Javaheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,066,764
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,019,377
- Issue date Jun 25, 2024
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology targets
- Patent number 11,982,946
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,768,442
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,709,436
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,650,047
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 11,526,085
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,513,442
- Issue date Nov 29, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for illumination adjustment
- Patent number 11,429,029
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 11,415,900
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining a value of a parameter of interest of a patte...
- Patent number 11,181,828
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,125,806
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Computational metrology
- Patent number 11,067,902
- Issue date Jul 20, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 11,022,892
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,009,343
- Issue date May 18, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 11,003,099
- Issue date May 11, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 10,816,909
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 10,739,687
- Issue date Aug 11, 2020
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,481,506
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Murat Bozkurt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a property of a substrate, inspection apparatus...
- Patent number 10,474,043
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,466,594
- Issue date Nov 5, 2019
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 10,437,163
- Issue date Oct 8, 2019
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION MODULE AND ASSOCIATED METHODS AND METROLOGY APPARATUS
- Publication number 20250208522
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G01 - MEASURING TESTING
Information Patent Application
TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
- Publication number 20250036031
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Aniruddha Ramakrishna SONDE
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus And Method For Determining A Characteristic Of...
- Publication number 20240412067
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20240012337
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE
- Publication number 20230341783
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Arnaud HUBAUX
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20230273255
- Publication date Aug 31, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS
- Publication number 20230236515
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A...
- Publication number 20230064193
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology System and Method for Determining a Characteristic of One...
- Publication number 20230062585
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20230058839
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...
- Publication number 20230004096
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS
- Publication number 20220350260
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Armand Eugene Albert
- G01 - MEASURING TESTING
Information Patent Application
IMPROVEMENTS IN METROLOGY TARGETS
- Publication number 20220260929
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Nikhil MEHTA
- G01 - MEASURING TESTING
Information Patent Application
TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS
- Publication number 20220035255
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20210389365
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210349395
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20210325174
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20210149312
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT
- Publication number 20210055663
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method For Determining a Characteristic of one...
- Publication number 20210003924
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...
- Publication number 20200379359
- Publication date Dec 3, 2020
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G01 - MEASURING TESTING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20200249576
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTE...
- Publication number 20200133140
- Publication date Apr 30, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method, Patterning Device, Apparatus and Computer Program
- Publication number 20200110342
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20200064744
- Publication date Feb 27, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20200050114
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Murat Bozkurt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20200041563
- Publication date Feb 6, 2020
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Design of a Metrology Target
- Publication number 20200033741
- Publication date Jan 30, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patrick WARNAAR

Person

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Target for measuring a parameter of a lithographic process

Method of determining control parameters of a device manufacturing...

Metrology apparatus and method for determining a characteristic of...

Metrology method and associated computer product

Metrology apparatus and method for determining a characteristic of...

Target for measuring a parameter of a lithographic process

Metrology system and method for determining a characteristic of one...

Metrology targets

Method of determining control parameters of a device manufacturing...

Metrology apparatus and method for determining a characteristic of...

Metrology apparatus and method for determining a characteristic of...

Metrology method and apparatus, substrate, lithographic system and...

Method of determining control parameters of a device manufacturing...

Method and apparatus for illumination adjustment

Metrology system and method for determining a characteristic of one...

Metrology method, patterning device, apparatus and computer program

Method of determining a value of a parameter of interest of a patte...

Metrology apparatus and method for determining a characteristic of...

Computational metrology

Method of measuring a structure, inspection apparatus, lithographic...

Metrology apparatus and method for determining a characteristic of...

Method and apparatus for design of a metrology target

Metrology method, patterning device, apparatus and computer program

Metrology system and method for determining a characteristic of one...

Metrology method and apparatus, substrate, lithographic system and...

Method of measuring a structure, inspection apparatus, lithographic...

Method of measuring a property of a substrate, inspection apparatus...

Method of measuring a structure, inspection apparatus, lithographic...

Method and apparatus for design of a metrology target

Patents Applicationslast 30 patents

ILLUMINATION MODULE AND ASSOCIATED METHODS AND METROLOGY APPARATUS

TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...

Metrology Apparatus And Method For Determining A Characteristic Of...

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

DETERMINING LITHOGRAPHIC MATCHING PERFORMANCE

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS

METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A...

Metrology System and Method for Determining a Characteristic of One...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...

A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS

IMPROVEMENTS IN METROLOGY TARGETS

TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

COMPUTATIONAL METROLOGY

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT

Metrology System and Method For Determining a Characteristic of one...

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...

COMPUTATIONAL METROLOGY

METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTE...

Metrology Method, Patterning Device, Apparatus and Computer Program

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Metrology Apparatus and Method for Determining a Characteristic of...

Method and Apparatus for Design of a Metrology Target