Paul Andre Lefevre

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical planarization pads with constant groove volume
- Patent number 11,938,584
- Issue date Mar 26, 2024
- CMC MATERIALS LLC
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Coated compressive subpad for chemical mechanical polishing
- Patent number 11,440,158
- Issue date Sep 13, 2022
- CMC Materials, Inc.
- Diane Scott
- B24 - GRINDING POLISHING
Information Patent Grant
Low density polishing pad
- Patent number 10,946,495
- Issue date Mar 16, 2021
- CMC Materials, Inc.
- Ping Huang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions
- Patent number 10,293,459
- Issue date May 21, 2019
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions...
- Patent number 10,160,092
- Issue date Dec 25, 2018
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and polishing surface layer
- Patent number 9,931,728
- Issue date Apr 3, 2018
- Cabot Microelectronics Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooved foundation layer and polishing surface l...
- Patent number 9,931,729
- Issue date Apr 3, 2018
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and window attached thereto
- Patent number 9,868,185
- Issue date Jan 16, 2018
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions
- Patent number 9,649,742
- Issue date May 16, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with polishing surface layer having an aperture or op...
- Patent number 9,597,769
- Issue date Mar 21, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having porogens with liquid filler
- Patent number 9,238,294
- Issue date Jan 19, 2016
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and polishing surface layer
- Patent number 9,067,297
- Issue date Jun 30, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooved foundation layer and polishing surface l...
- Patent number 9,067,298
- Issue date Jun 30, 2015
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME
- Publication number 20240238937
- Publication date Jul 18, 2024
- CMC Materials LLC
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE
- Publication number 20230166380
- Publication date Jun 1, 2023
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE
- Publication number 20220234167
- Publication date Jul 28, 2022
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL POLISHING PAD WITH TEXTURED PLATEN ADHESIVE
- Publication number 20220203497
- Publication date Jun 30, 2022
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC...
- Publication number 20220193860
- Publication date Jun 23, 2022
- CMC Materials, Inc.
- Dustin MILLER
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME
- Publication number 20200353588
- Publication date Nov 12, 2020
- Cabot Microelectronics Corporation
- Paul Andre LEFEVRE
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20180141183
- Publication date May 24, 2018
- Cabot Microelectronics Corporation
- Diane SCOTT
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20170203409
- Publication date Jul 20, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND WINDOW ATTACHED THERETO
- Publication number 20170120417
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
LOW DENSITY POLISHING PAD
- Publication number 20160221145
- Publication date Aug 4, 2016
- Ping Huang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20160144477
- Publication date May 26, 2016
- Diane Scott
- B24 - GRINDING POLISHING
Information Patent Application
HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM
- Publication number 20160030910
- Publication date Feb 4, 2016
- SDCmaterials, Inc.
- Maximillian A. BIBERGER
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
POLISHING PAD HAVING POROGENS WITH LIQUID FILLER
- Publication number 20150367478
- Publication date Dec 24, 2015
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20150273656
- Publication date Oct 1, 2015
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20150273655
- Publication date Oct 1, 2015
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...
- Publication number 20150266160
- Publication date Sep 24, 2015
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
LOW DENSITY POLISHING PAD
- Publication number 20150038066
- Publication date Feb 5, 2015
- NexPlanar Corporation
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...
- Publication number 20140273777
- Publication date Sep 18, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM
- Publication number 20140263190
- Publication date Sep 18, 2014
- Maximilian A. Biberger
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20140206268
- Publication date Jul 24, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OP...
- Publication number 20130324020
- Publication date Dec 5, 2013
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20130137350
- Publication date May 30, 2013
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...
- Publication number 20130137349
- Publication date May 30, 2013
- Paul Andre Lefevre
- B24 - GRINDING POLISHING

Paul Andre Lefevre

Person

Patents Grantslast 30 patents

Chemical mechanical planarization pads with constant groove volume

Coated compressive subpad for chemical mechanical polishing

Low density polishing pad

Polishing pad having polishing surface with continuous protrusions

Polishing pad having polishing surface with continuous protrusions...

Polishing pad with foundation layer and polishing surface layer

Polishing pad with grooved foundation layer and polishing surface l...

Polishing pad with foundation layer and window attached thereto

Polishing pad having polishing surface with continuous protrusions

Polishing pad with polishing surface layer having an aperture or op...

Polishing pad having porogens with liquid filler

Polishing pad with foundation layer and polishing surface layer

Polishing pad with grooved foundation layer and polishing surface l...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME

ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE

ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE

CHEMICAL-MECHANICAL POLISHING PAD WITH TEXTURED PLATEN ADHESIVE

CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC...

CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME

COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

POLISHING PAD WITH FOUNDATION LAYER AND WINDOW ATTACHED THERETO

LOW DENSITY POLISHING PAD

COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING

HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM

POLISHING PAD HAVING POROGENS WITH LIQUID FILLER

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...

LOW DENSITY POLISHING PAD

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...

HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OP...

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...