Paul Christiaan HINNEN

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,947,269
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,784,098
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system to monitor a process apparatus
- Patent number 11,733,610
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,728,224
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,710,668
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,604,419
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Separation of contributions to metrology data
- Patent number 11,520,239
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,143,972
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,145,557
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,185
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,184
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 11,092,900
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,022,897
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 10,996,570
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus with increased bandwidth
- Patent number 10,901,323
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,811,323
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and apparatus with increased bandwidth
- Patent number 10,732,514
- Issue date Aug 4, 2020
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter, a...
- Patent number 10,615,084
- Issue date Apr 7, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method and system to monitor a process apparatus
- Patent number 10,571,806
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,546,790
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beat patterns for alignment on small metrology targets
- Patent number 10,488,768
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Bastiaan Onne Fagginger Auer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 10,481,503
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 10,474,039
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Paul Christiaan Hinnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 10,453,758
- Issue date Oct 22, 2019
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method, lithographic apparatus, mask and substrate
- Patent number 10,394,137
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Youri Johannes Laurentius Maria Van Dommelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a process window for a lithographic process,...
- Patent number 10,133,191
- Issue date Nov 20, 2018
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240014078
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
- Publication number 20240004299
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20230042759
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR METROLOGY OPTIMIZATION
- Publication number 20220082944
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Samee Ur REHMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20220066330
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210384086
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210335678
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...
- Publication number 20210255552
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Joannes Jitse VENSELAAR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM
- Publication number 20210255553
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210035871
- Publication date Feb 4, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A PATTERNING PROCESS, DEVICE MANUFACTURING ME...
- Publication number 20200356013
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Jeroen VAN DONGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus with Increased Bandwidth
- Publication number 20200319562
- Publication date Oct 8, 2020
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200264522
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Laurentius Cornelius DE WINTER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200185281
- Publication date Jun 11, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200126872
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
- Publication number 20200124968
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Method, Patterning Device, Apparatus and Computer Program
- Publication number 20200110342
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20200073254
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200013685
- Publication date Jan 9, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus with Increased Bandwidth
- Publication number 20190258177
- Publication date Aug 22, 2019
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...
- Publication number 20190250094
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
- Publication number 20190196334
- Publication date Jun 27, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...
- Publication number 20190171115
- Publication date Jun 6, 2019
- ASML NETHERLANDS B.V.
- Joannes Jitse VENSELAAR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20190155173
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20190086810
- Publication date Mar 21, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS
- Publication number 20190072860
- Publication date Mar 7, 2019
- ASML NETHERLANDS B.V.
- Bastiaan Onne FAGGINGER AUER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
- Publication number 20180253018
- Publication date Sep 6, 2018
- ASML NETHERLANDS B.V.
- Youri Johannes Laurentius Maria VAN DOMMELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...
- Publication number 20180046091
- Publication date Feb 15, 2018
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255738
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G06 - COMPUTING CALCULATING COUNTING

Paul Christiaan HINNEN

Person

Patents Grantslast 30 patents

Method and apparatus to determine a patterning process parameter us...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and system to monitor a process apparatus

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method of determining information about a patterning process, metho...

Separation of contributions to metrology data

Metrology method, patterning device, apparatus and computer program

Methods and patterning devices and apparatuses for measuring focus...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of a lithographic pr...

Method of determining information about a patterning process, metho...

Metrology method, patterning device, apparatus and computer program

Method and apparatus for measuring a parameter of interest using im...

Metrology method and apparatus with increased bandwidth

Method and apparatus to determine a patterning process parameter

Metrology method and apparatus with increased bandwidth

Method and apparatus to determine a patterning process parameter, a...

Method and system to monitor a process apparatus

Method and apparatus to determine a patterning process parameter

Beat patterns for alignment on small metrology targets

Method and apparatus for measuring a parameter of a lithographic pr...

Methods and patterning devices and apparatuses for measuring focus...

Method and apparatus to determine a patterning process parameter us...

Inspection method, lithographic apparatus, mask and substrate

Method for determining a process window for a lithographic process,...

Patents Applicationslast 30 patents

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

METHOD FOR METROLOGY OPTIMIZATION

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...

METROLOGY METHOD, PATTERNING DEVICE, APPARATUS AND COMPUTER PROGRAM

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD OF CONTROLLING A PATTERNING PROCESS, DEVICE MANUFACTURING ME...

Metrology Method and Apparatus with Increased Bandwidth

Methods and Patterning Devices and Apparatuses for Measuring Focus...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

Metrology Method, Patterning Device, Apparatus and Computer Program

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Metrology Method and Apparatus with Increased Bandwidth

METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS

INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE

Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER