Paul F. PETRIC

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and methods for electron beam lithography using array cat...
- Patent number 9,715,995
- Issue date Jul 25, 2017
- KLA-Tencor Corporation
- Keith Standiford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflection electron beam projection lithography using an ExB separator
- Patent number 9,355,818
- Issue date May 31, 2016
- KLA-Tencor Corporation
- Paul F. Petric
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Compact high-voltage electron gun
- Patent number 8,957,394
- Issue date Feb 17, 2015
- KLA-Tencor Corporation
- Alan D. Brodie
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron microscope assembly for viewing the wafer plane image of a...
- Patent number 8,642,981
- Issue date Feb 4, 2014
- KLA-Tencor Corporation
- Paul Petric
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Quasi-annular reflective electron patterning device
- Patent number 8,373,144
- Issue date Feb 12, 2013
- KLA-Tencor Corporation
- Mark A. McCord
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Well-based dynamic pattern generator
- Patent number 8,253,119
- Issue date Aug 28, 2012
- KLA-Tencor Corporation
- Alan D. Brodie
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for obtaining topographical dark-field images...
- Patent number 7,714,287
- Issue date May 11, 2010
- KLA-Tencor Corporation
- Edward M. James
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods of controlling surface charge and focus
- Patent number 6,828,571
- Issue date Dec 7, 2004
- KLA-Tencor Technologies Corporation
- Mark A. McCord
- G01 - MEASURING TESTING
Information Patent Grant
Curvilinear axis set-up for charged particle lithography
- Patent number 6,262,425
- Issue date Jul 17, 2001
- International Business Machines Corporation
- Michael S. Gordon
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam projection lithography system (EBPS)
- Patent number 6,069,684
- Issue date May 30, 2000
- International Business Machines Corporation
- Steven D. Golladay
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Curvilinear variable axis lens correction with shifted dipoles
- Patent number 5,793,048
- Issue date Aug 11, 1998
- International Business Machines Corporation
- Paul F. Petric
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for centering a lens in a charged-particle system
- Patent number 5,747,814
- Issue date May 5, 1998
- International Business Machines Corporation
- Michael Stuart Gordon
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Simultaneous deflections in charged-particle beams
- Patent number 5,650,628
- Issue date Jul 22, 1997
- International Business Machines Corporation
- Michael Stuart Gordon
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Variable curvilinear axis deflection means for particle optical lenses
- Patent number 5,635,719
- Issue date Jun 3, 1997
- International Business Machines Corporation
- Paul F. Petric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam nano-metrology system
- Patent number 5,585,629
- Issue date Dec 17, 1996
- International Business Machines Corporation
- Samuel K. Doran
- G01 - MEASURING TESTING
Information Patent Grant
Inductively coupled dual-stage magnetic deflection yoke
- Patent number 5,530,251
- Issue date Jun 25, 1996
- International Business Machines Corporation
- Paul F. Petric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled dual-stage magnetic deflection yoke
- Patent number 5,530,252
- Issue date Jun 25, 1996
- International Business Machines Corporation
- Paul F. Petric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable axis stigmator
- Patent number 5,481,164
- Issue date Jan 2, 1996
- International Business Machines Corporation
- Guenther O. Langner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable axis stigmator
- Patent number 5,389,858
- Issue date Feb 14, 1995
- International Business Machines Corporation
- Guenther O. Langner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lens and deflection system for plural-level telecentr...
- Patent number 5,136,167
- Issue date Aug 4, 1992
- International Business Machines Corporation
- Guenther O. Langner
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPACT HIGH-VOLTAGE ELECTRON GUN
- Publication number 20130134324
- Publication date May 30, 2013
- KLA-Tencor Corporation
- Alan D. BRODIE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Reflection Electron Beam Projection Lithography Using an ExB Separator
- Publication number 20110291021
- Publication date Dec 1, 2011
- Paul F. PETRIC
- B82 - NANO-TECHNOLOGY

Paul F. PETRIC

Person

Patents Grantslast 30 patents

Apparatus and methods for electron beam lithography using array cat...

Reflection electron beam projection lithography using an ExB separator

Compact high-voltage electron gun

Electron microscope assembly for viewing the wafer plane image of a...

Quasi-annular reflective electron patterning device

Well-based dynamic pattern generator

Apparatus and method for obtaining topographical dark-field images...

Apparatus and methods of controlling surface charge and focus

Curvilinear axis set-up for charged particle lithography

Electron beam projection lithography system (EBPS)

Curvilinear variable axis lens correction with shifted dipoles

Method for centering a lens in a charged-particle system

Simultaneous deflections in charged-particle beams

Variable curvilinear axis deflection means for particle optical lenses

Electron beam nano-metrology system

Inductively coupled dual-stage magnetic deflection yoke

Inductively coupled dual-stage magnetic deflection yoke

Variable axis stigmator

Variable axis stigmator

Electron beam lens and deflection system for plural-level telecentr...

Patents Applicationslast 30 patents

COMPACT HIGH-VOLTAGE ELECTRON GUN

Reflection Electron Beam Projection Lithography Using an ExB Separator