Paul Higgins

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Harriman, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Technique to create a buried plate in embedded dynamic random acces...
- Patent number 8,563,446
- Issue date Oct 22, 2013
- International Business Machines Corporation
- Ashima B. Chakravarti
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Technique to create a buried plate in embedded dynamic random acces...
- Patent number 8,236,710
- Issue date Aug 7, 2012
- International Business Machines Corporation
- Ashima B. Chakravarti
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Formation of ultra-thin oxide layers by self-limiting interfacial o...
- Patent number 7,235,440
- Issue date Jun 26, 2007
- Tokyo Electron Limited
- David L O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming uniform ultra-thin oxynitride layers
- Patent number 7,202,186
- Issue date Apr 10, 2007
- Tokyo Electron Limited
- David L O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUE TO CREATE A BURIED PLATE IN EMBEDDED DYNAMIC RANDOM ACCES...
- Publication number 20120228736
- Publication date Sep 13, 2012
- International Business Machines Corporation
- ASHIMA B. CHAKRAVARTI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE TO CREATE A BURIED PLATE IN EMBEDDED DYNAMIC RANDOM ACCES...
- Publication number 20120086103
- Publication date Apr 12, 2012
- International Business Machines Corporation
- ASHIMA B. CHAKRAVARTI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of ultra-thin oxide layers by self-limiting interfacial o...
- Publication number 20050026453
- Publication date Feb 3, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming uniform ultra-thin oxynitride layers
- Publication number 20050026459
- Publication date Feb 3, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...