Paul Jacques VAN WIJNEN

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 11,977,034
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,996,176
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,746,668
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,317,191
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 9,594,029
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of optimizing a die size, method of designing a pattern devi...
- Patent number 8,642,235
- Issue date Feb 4, 2014
- ASML Netherlands B.V.
- Petar Veselinovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, combination of lithographic apparatus and p...
- Patent number 7,679,714
- Issue date Mar 16, 2010
- ASML Netherlands B.V.
- Johannes Onvlee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic processing cell, lithographic apparatus, track and dev...
- Patent number 7,679,715
- Issue date Mar 16, 2010
- ASML Netherlands B.V.
- Stefan Geerte Kruijswijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic processing cell, lithographic apparatus, track and dev...
- Patent number 7,403,259
- Issue date Jul 22, 2008
- ASML Netherlands B.V.
- Stefan Geerte Kruijswijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device inspection method and apparatus using an asymmetric marker
- Patent number 7,112,813
- Issue date Sep 26, 2006
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20210215622
- Publication date Jul 15, 2021
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G05 - CONTROLLING REGULATING
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20200319118
- Publication date Oct 8, 2020
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20190301850
- Publication date Oct 3, 2019
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G01 - MEASURING TESTING
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20170160073
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G01 - MEASURING TESTING
Information Patent Application
Methods and Apparatus for Measuring A Property of a Substrate
- Publication number 20140354969
- Publication date Dec 4, 2014
- ASML NETHERLANDS B.V.
- Wouter Lodewijk Elings
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPTIMIZING A DIE SIZE, METHOD OF DESIGNING A PATTERN DEVI...
- Publication number 20120308921
- Publication date Dec 6, 2012
- ASML NETHERLANDS B.V.
- Petar Veselinovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic processing cell, lithographic apparatus, track and dev...
- Publication number 20080266538
- Publication date Oct 30, 2008
- ASML NETHERLANDS B.V.
- Stefan Geerte Kruijswijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, combination of lithographic apparatus and p...
- Publication number 20080145791
- Publication date Jun 19, 2008
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic processing cell, lithographic apparatus, track and dev...
- Publication number 20050206868
- Publication date Sep 22, 2005
- ASML NETHERLANDS B.V.
- Stefan Geerte Kruijswijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device inspection
- Publication number 20040129900
- Publication date Jul 8, 2004
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Paul Jacques VAN WIJNEN

Person

Patents Grantslast 30 patents

Methods and apparatus for measuring a property of a substrate

Methods and apparatus for measuring a property of a substrate

Methods and apparatus for measuring a property of a substrate

Methods and apparatus for measuring a property of a substrate

Methods and apparatus for measuring a property of a substrate

Method of optimizing a die size, method of designing a pattern devi...

Lithographic apparatus, combination of lithographic apparatus and p...

Lithographic processing cell, lithographic apparatus, track and dev...

Lithographic processing cell, lithographic apparatus, track and dev...

Device inspection method and apparatus using an asymmetric marker

Patents Applicationslast 30 patents

Methods and Apparatus for Measuring a Property of a Substrate

Methods and Apparatus for Measuring a Property of a Substrate

Methods and Apparatus for Measuring a Property of a Substrate

Methods and Apparatus for Measuring a Property of a Substrate

Methods and Apparatus for Measuring A Property of a Substrate

METHOD OF OPTIMIZING A DIE SIZE, METHOD OF DESIGNING A PATTERN DEVI...

Lithographic processing cell, lithographic apparatus, track and dev...

Lithographic apparatus, combination of lithographic apparatus and p...

Lithographic processing cell, lithographic apparatus, track and dev...

Device inspection