Paul L. Roselle

Person

Webster, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low temperature insitu image reversal process for microelectric fab...
- Patent number 5,340,438
- Issue date Aug 23, 1994
- Eastman Kodak Company
- Paul L. Roselle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making two-phase charge coupled device
- Patent number 5,292,682
- Issue date Mar 8, 1994
- Eastman Kodak Company
- Eric G. Stevens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching indium tin oxide using a deposited silicon nitride mask
- Patent number 5,230,771
- Issue date Jul 27, 1993
- Eastman Kodak Company
- Paul L. Roselle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching indium tin oxide
- Patent number 5,171,401
- Issue date Dec 15, 1992
- Eastman Kodak Company
- Paul L. Roselle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming planar ITO gate electrode array structures
- Patent number 5,114,872
- Issue date May 19, 1992
- Eastman Kodak Company
- Paul L. Roselle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching indium tin oxide
- Patent number 5,032,221
- Issue date Jul 16, 1991
- Eastman Kodak Company
- Paul L. Roselle
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Gaseous cleaning method for silicon devices
- Patent number 4,923,828
- Issue date May 8, 1990
- Eastman Kodak Company
- Ronald Gluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to eliminate the re-entrant profile in a double polysilicon...
- Patent number 4,888,298
- Issue date Dec 19, 1989
- Eastman Kodak Company
- Lydia L. Rivaud
- H01 - BASIC ELECTRIC ELEMENTS

Paul L. Roselle

Person

Patents Grantslast 30 patents

Low temperature insitu image reversal process for microelectric fab...

Method of making two-phase charge coupled device

Plasma etching indium tin oxide using a deposited silicon nitride mask

Plasma etching indium tin oxide

Forming planar ITO gate electrode array structures

Etching indium tin oxide

Gaseous cleaning method for silicon devices

Process to eliminate the re-entrant profile in a double polysilicon...