Paul M. Feeney

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compositions for polishing aluminum/copper and titanium in damascen...
- Patent number 9,343,330
- Issue date May 17, 2016
- Cabot Microelectronics Corporation
- Vlasta Brusic
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing composition containing polyether amine
- Patent number 8,741,009
- Issue date Jun 3, 2014
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled electrochemical polishing method
- Patent number 7,998,335
- Issue date Aug 16, 2011
- Cabot Microelectronics Corporation
- Paul M. Feeney
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Compositions and methods for CMP of phase change alloys
- Patent number 7,897,061
- Issue date Mar 1, 2011
- Cabot Microelectronics Corporation
- Jeffrey Dysard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and method for damascene CMP
- Patent number 7,837,888
- Issue date Nov 23, 2010
- Cabot Microelectronics Corporation
- Paul M. Feeney
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition containing polyether amine
- Patent number 7,585,340
- Issue date Sep 8, 2009
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Grant
Method of reducing in-trench smearing during polishing
- Patent number 6,841,479
- Issue date Jan 11, 2005
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preequilibrium polishing method and system
- Patent number 6,726,534
- Issue date Apr 27, 2004
- Cabot Microelectronics Corporation
- Gregory H. Bogush
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical planarization of metallurgy
- Patent number 6,632,377
- Issue date Oct 14, 2003
- International Business Machines Corporation
- Vlasta Brusic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing planarization defects
- Patent number 6,503,827
- Issue date Jan 7, 2003
- International Business Machines Corporation
- Susan G. Bombardier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure of column interconnect
- Patent number 6,495,917
- Issue date Dec 17, 2002
- International Business Machines Corporation
- John J. Ellis-Monaghan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metallurgy for semiconductor devices
- Patent number 6,426,558
- Issue date Jul 30, 2002
- International Business Machines Corporation
- Jonathan Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical-polishing slurry and method for polishing metal...
- Patent number 6,355,565
- Issue date Mar 12, 2002
- International Business Machines Corporation
- Paul M. Feeney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of CsOH in a dielectric CMP slurry
- Patent number 6,350,393
- Issue date Feb 26, 2002
- Cabot Microelectronics Corporation
- Alicia F. Francis
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry for mechanical polishing (CMP) of metals and use thereof
- Patent number 6,348,076
- Issue date Feb 19, 2002
- International Business Machines Corporation
- Donald F. Canaperi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical mechanical polishing slurry and method for polishing metal...
- Patent number 6,294,105
- Issue date Sep 25, 2001
- International Business Machines Corporation
- Paul M. Feeney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Polishing composition containing polyether amine
- Publication number 20090289033
- Publication date Nov 26, 2009
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Application
COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS
- Publication number 20090156006
- Publication date Jun 18, 2009
- Sriram Anjur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compositions for polishing aluminum/copper and titanium in damascen...
- Publication number 20080134585
- Publication date Jun 12, 2008
- Cabot Microelectronics Corporation
- Vlasta Brusic
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition and method for damascene CMP
- Publication number 20080113589
- Publication date May 15, 2008
- Cabot Microelectronics Corporation
- Paul Feeney
- B24 - GRINDING POLISHING
Information Patent Application
CMP of copper/ruthenium/tantalum substrates
- Publication number 20080105652
- Publication date May 8, 2008
- Cabot Microelectronics Corporation
- Vlasta Brusic
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing composition containing polyether amine
- Publication number 20070251155
- Publication date Nov 1, 2007
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- B24 - GRINDING POLISHING
Information Patent Application
Compositions and methods for CMP of phase change alloys
- Publication number 20070178700
- Publication date Aug 2, 2007
- Jeffrey Dysard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for controlling polysilicon removal
- Publication number 20070077865
- Publication date Apr 5, 2007
- Cabot Microelectronics Corporation
- Jeffrey M. Dysard
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Controlled electrochemical polishing method
- Publication number 20060281196
- Publication date Dec 14, 2006
- Cabot Microelectronics Corporation
- Paul M. Feeney
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of reducing in-trench smearing during polishing
- Publication number 20020151177
- Publication date Oct 17, 2002
- Cabot Microelectrics Corporation
- Isaac K. Cherian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing slurry and method for polishing metal...
- Publication number 20010052587
- Publication date Dec 20, 2001
- International Business Machines Corporation
- Paul M. Feeney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
USE OF CSOH IN A DIELECTRIC CMP SLURRY
- Publication number 20010051433
- Publication date Dec 13, 2001
- Alicia F. Francis
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Integrated chemical-mechanical polishing
- Publication number 20010037821
- Publication date Nov 8, 2001
- Bradley J. Staley
- B24 - GRINDING POLISHING

Paul M. Feeney

Person

Patents Grantslast 30 patents

Compositions for polishing aluminum/copper and titanium in damascen...

Polishing composition containing polyether amine

Controlled electrochemical polishing method

Compositions and methods for CMP of phase change alloys

Composition and method for damascene CMP

Polishing composition containing polyether amine

Method of reducing in-trench smearing during polishing

Preequilibrium polishing method and system

Chemical-mechanical planarization of metallurgy

Method of reducing planarization defects

Method and structure of column interconnect

Metallurgy for semiconductor devices

Chemical-mechanical-polishing slurry and method for polishing metal...

Use of CsOH in a dielectric CMP slurry

Slurry for mechanical polishing (CMP) of metals and use thereof

Chemical mechanical polishing slurry and method for polishing metal...

Patents Applicationslast 30 patents

Polishing composition containing polyether amine

COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS

Compositions for polishing aluminum/copper and titanium in damascen...

Composition and method for damascene CMP

CMP of copper/ruthenium/tantalum substrates

Polishing composition containing polyether amine

Compositions and methods for CMP of phase change alloys

Method for controlling polysilicon removal

Controlled electrochemical polishing method

Method of reducing in-trench smearing during polishing

Chemical mechanical polishing slurry and method for polishing metal...

USE OF CSOH IN A DIELECTRIC CMP SLURRY

Integrated chemical-mechanical polishing