Paul P. Tesch

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electron emitter source
- Patent number 10,192,708
- Issue date Jan 29, 2019
- OREGON PHYSICS, LLC
- Paul P. Tesch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF system, magnetic filter, and high voltage isolation for an induc...
- Patent number 9,655,223
- Issue date May 16, 2017
- Oregon Physics, LLC
- Noel S. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,401,262
- Issue date Jul 26, 2016
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,029,812
- Issue date May 12, 2015
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,692,217
- Issue date Apr 8, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High voltage isolation and cooling for an inductively coupled plasm...
- Patent number 8,525,419
- Issue date Sep 3, 2013
- Oregon Physics, LLC
- Noel S. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,405,054
- Issue date Mar 26, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,076,650
- Issue date Dec 13, 2011
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped and low density focused ion beams
- Patent number 6,949,756
- Issue date Sep 27, 2005
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-column FIB for nanofabrication applications
- Patent number 6,797,969
- Issue date Sep 28, 2004
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam system using multiple electron beams
- Patent number 6,797,953
- Issue date Sep 28, 2004
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam system
- Patent number 6,710,338
- Issue date Mar 23, 2004
- FEI Company
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON EMITTER SOURCE
- Publication number 20170148605
- Publication date May 25, 2017
- OREGON PHYSICS, LLC
- Paul P. Tesch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Source Plasma Focused Ion Beam System
- Publication number 20150318140
- Publication date Nov 5, 2015
- FEI Company
- Noel Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20140312245
- Publication date Oct 23, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF SYSTEM, MAGNETIC FILTER, AND HIGH VOLTAGE ISOLATION FOR AN INDUC...
- Publication number 20140077699
- Publication date Mar 20, 2014
- OREGON PHYSICS, LLC
- Roderick W. Boswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20130309421
- Publication date Nov 21, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multi-Source Plasma Focused Ion Beam System
- Publication number 20120080407
- Publication date Apr 5, 2012
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multibeam System
- Publication number 20110163068
- Publication date Jul 7, 2011
- Mark Utlaut
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH VOLTAGE ISOLATION AND COOLING FOR AN INDUCTIVELY COUPLED PLASM...
- Publication number 20100126964
- Publication date May 27, 2010
- OREGON PHYSICS, LLC
- Noel S. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20090309018
- Publication date Dec 17, 2009
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electron beam system using multiple electron beams
- Publication number 20020117967
- Publication date Aug 29, 2002
- Robert L. Gerlach
- B82 - NANO-TECHNOLOGY
Information Patent Application
Focused ion beam system
- Publication number 20020084426
- Publication date Jul 4, 2002
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shaped and low density focused ion beams
- Publication number 20010045525
- Publication date Nov 29, 2001
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-column FIB for nanofabrication applications
- Publication number 20010032939
- Publication date Oct 25, 2001
- Robert L. Gerlach
- H01 - BASIC ELECTRIC ELEMENTS

Paul P. Tesch

Person

Patents Grantslast 30 patents

Electron emitter source

RF system, magnetic filter, and high voltage isolation for an induc...

Multi-source plasma focused ion beam system

Multi-source plasma focused ion beam system

Multi-source plasma focused ion beam system

High voltage isolation and cooling for an inductively coupled plasm...

Multi-source plasma focused ion beam system

Multi-source plasma focused ion beam system

Shaped and low density focused ion beams

Multi-column FIB for nanofabrication applications

Electron beam system using multiple electron beams

Focused ion beam system

Patents Applicationslast 30 patents

ELECTRON EMITTER SOURCE

Multi-Source Plasma Focused Ion Beam System

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

RF SYSTEM, MAGNETIC FILTER, AND HIGH VOLTAGE ISOLATION FOR AN INDUC...

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

Multi-Source Plasma Focused Ion Beam System

Multibeam System

HIGH VOLTAGE ISOLATION AND COOLING FOR AN INDUCTIVELY COUPLED PLASM...

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

Electron beam system using multiple electron beams

Focused ion beam system

Shaped and low density focused ion beams

Multi-column FIB for nanofabrication applications