Paul Richard Proctor

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
High K artificial lattices for capacitor applications to use in Cu...
- Patent number 7,095,073
- Issue date Aug 22, 2006
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polisher hardware design
- Patent number 7,052,372
- Issue date May 30, 2006
- Chartered Semiconductor Manufacturing, Ltd.
- Seng-Keong Victor Lim
- B24 - GRINDING POLISHING
Information Patent Grant
High K artificial lattices for capacitor applications to use in CU...
- Patent number 6,830,971
- Issue date Dec 14, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear polishing for improving substrate uniformity
- Patent number 6,726,545
- Issue date Apr 27, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- B24 - GRINDING POLISHING
Information Patent Grant
STI scheme to prevent fox recess during pre-CMP HF dip
- Patent number 6,673,695
- Issue date Jan 6, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Victor Seng-Keong Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple step CMP polishing
- Patent number 6,663,472
- Issue date Dec 16, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Victor Seng-Keong Lim
- B24 - GRINDING POLISHING
Information Patent Grant
Pre STI-CMP planarization scheme
- Patent number 6,664,190
- Issue date Dec 16, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Feng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toxic residual gas removal by non-reactive ion sputtering
- Patent number 6,660,642
- Issue date Dec 9, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Zou Zheng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
High K artificial lattices for capacitor applications to use in Cu...
- Publication number 20050118780
- Publication date Jun 2, 2005
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High K artificial lattices for capacitor applications to use in CU...
- Publication number 20040087101
- Publication date May 6, 2004
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Linear polishing for improving substrate uniformity
- Publication number 20030203710
- Publication date Oct 30, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Subramanian Balakumar
- B24 - GRINDING POLISHING
Information Patent Application
Multiple step CMP polishing
- Publication number 20030148712
- Publication date Aug 7, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Victor Seng-Keong Lim
- B24 - GRINDING POLISHING
Information Patent Application
Chemical-mechanical polisher hardware design
- Publication number 20030114086
- Publication date Jun 19, 2003
- Seng-Keong Victor Lim
- B24 - GRINDING POLISHING
Information Patent Application
Pre STI-CMP planarization scheme
- Publication number 20030054654
- Publication date Mar 20, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Cheng-Hou Loh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Toxic residual gas removal by non-reactive ion sputtering
- Publication number 20030022504
- Publication date Jan 30, 2003
- Chartered Semiconductor Manufacturing Ltd.
- Zou Zheng
- H01 - BASIC ELECTRIC ELEMENTS

Paul Richard Proctor

Person

Patents Grantslast 30 patents

High K artificial lattices for capacitor applications to use in Cu...

Chemical-mechanical polisher hardware design

High K artificial lattices for capacitor applications to use in CU...

Linear polishing for improving substrate uniformity

STI scheme to prevent fox recess during pre-CMP HF dip

Multiple step CMP polishing

Pre STI-CMP planarization scheme

Toxic residual gas removal by non-reactive ion sputtering

Patents Applicationslast 30 patents

High K artificial lattices for capacitor applications to use in Cu...

High K artificial lattices for capacitor applications to use in CU...

Linear polishing for improving substrate uniformity

Multiple step CMP polishing

Chemical-mechanical polisher hardware design

Pre STI-CMP planarization scheme

Toxic residual gas removal by non-reactive ion sputtering