Paul Rissman

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mask patterns for use in multiple-exposure lithography
- Patent number 8,082,524
- Issue date Dec 20, 2011
- Luminescent Technologies, Inc.
- Robert P. Gleason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask-patterns including intentional breaks
- Patent number 7,793,253
- Issue date Sep 7, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating aperture phase-shift mask fabrication method
- Patent number 6,986,972
- Issue date Jan 17, 2006
- LSI Logic Corporation
- Paul Rissman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned alloy capping layers for copper interconnect structures
- Patent number 6,747,358
- Issue date Jun 8, 2004
- LSI Logic Corporation
- Paul Rissman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating self-aligned alloy capping layers for copper in...
- Patent number 6,566,262
- Issue date May 20, 2003
- LSI Logic Corporation
- Paul Rissman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital camera-ready printer
- Patent number 6,552,743
- Issue date Apr 22, 2003
- Hewlett-Packard Development Company, L.P.
- Paul Rissman
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Forming a buried insulator layer using plasma source ion implantation
- Patent number 5,661,043
- Issue date Aug 26, 1997
- Paul Rissman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam proximity effect correction by reverse field pattern...
- Patent number 4,463,265
- Issue date Jul 31, 1984
- Hewlett-Packard Company
- Geraint Owen
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Mask Patterns for Use in Multiple-Exposure Lithography
- Publication number 20090319978
- Publication date Dec 24, 2009
- Robert P. Gleason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask-Patterns Including Intentional Breaks
- Publication number 20070196742
- Publication date Aug 23, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ion implantation phase shift mask
- Publication number 20040241554
- Publication date Dec 2, 2004
- LSI Logic Corporation, Milpitas, CA
- Paul Rissman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Paul Rissman

Person

Patents Grantslast 30 patents

Mask patterns for use in multiple-exposure lithography

Mask-patterns including intentional breaks

Alternating aperture phase-shift mask fabrication method

Self-aligned alloy capping layers for copper interconnect structures

Method for creating self-aligned alloy capping layers for copper in...

Digital camera-ready printer

Forming a buried insulator layer using plasma source ion implantation

Electron beam proximity effect correction by reverse field pattern...

Patents Applicationslast 30 patents

Mask Patterns for Use in Multiple-Exposure Lithography

Mask-Patterns Including Intentional Breaks

Ion implantation phase shift mask