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Paul Schroeder
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Dresden-Langerbrueck, DE
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Patents Grants
last 30 patents
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Patent Grant
Method and apparatus for determining photoresist pattern linearity
Patent number
6,579,650
Issue date
Jun 17, 2003
Infineon Technologies AG
Tobias Mono
G01 - MEASURING TESTING
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Patent Grant
Self-aligned STI process using nitride hard mask
Patent number
6,551,874
Issue date
Apr 22, 2003
Infineon Technologies, AG
John Pohl
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
Method and apparatus for aerial image improvement in projection lit...
Publication number
20040207827
Publication date
Oct 21, 2004
Paul Schroeder
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Self-aligned STI process using nitride hard mask
Publication number
20030045051
Publication date
Mar 6, 2003
Infineon Technologies North America Corp.
John Pohl
H01 - BASIC ELECTRIC ELEMENTS