Paul W. Dryer

Person

Mesa, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for immersion treatment of semiconductor and o...
- Patent number 6,641,675
- Issue date Nov 4, 2003
- Z Cap, L.L.C.
- Paul William Dryer
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method and apparatus for semiconductor wafer cleaning with reuse of...
- Patent number 6,415,803
- Issue date Jul 9, 2002
- Z Cap, L.L.C.
- James B. Sundin
- B08 - CLEANING
Information Patent Grant
Method and apparatus for immersion treatment of semiconductor and o...
- Patent number 6,284,055
- Issue date Sep 4, 2001
- Z Cap L.L.C.
- Paul William Dryer
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method and apparatus for immersion treatment of semiconductor and o...
- Patent number 6,244,280
- Issue date Jun 12, 2001
- SpeedFam-IPEC Corporation
- Paul William Dryer
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method for etching a dielectric layer over a semiconductor substrate
- Patent number 6,187,216
- Issue date Feb 13, 2001
- Motorola, Inc.
- Paul William Dryer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer treatment
- Patent number 6,146,468
- Issue date Nov 14, 2000
- SpeedFam-IPEC Corporation
- Paul William Dryer
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Method and apparatus for immersion cleaning of semiconductor devices
- Patent number 6,021,791
- Issue date Feb 8, 2000
- SpeedFam-IPEC Corporation
- Paul William Dryer
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Carboxylic acid etching solution and method
- Patent number 5,824,601
- Issue date Oct 20, 1998
- Motorola, Inc.
- Patrick P. H. Dao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for etching a dielectric layer on a semiconductor
- Patent number 5,593,538
- Issue date Jan 14, 1997
- Motorola, Inc.
- Michael J. Davison
- H01 - BASIC ELECTRIC ELEMENTS

Paul W. Dryer

Person

Patents Grantslast 30 patents

Method and apparatus for immersion treatment of semiconductor and o...

Method and apparatus for semiconductor wafer cleaning with reuse of...

Method and apparatus for immersion treatment of semiconductor and o...

Method and apparatus for immersion treatment of semiconductor and o...

Method for etching a dielectric layer over a semiconductor substrate

Semiconductor wafer treatment

Method and apparatus for immersion cleaning of semiconductor devices

Carboxylic acid etching solution and method

Method for etching a dielectric layer on a semiconductor