Pavel Nesladek

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Dresden, DE

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Patents Applicationslast 30 patents

Information Patent Application
REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS B...
- Publication number 20110027699
- Publication date Feb 3, 2011
- Anna Tchikoulaeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Blank, Photomask and Method of Manufacturing a Photomask
- Publication number 20080318139
- Publication date Dec 25, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- B82 - NANO-TECHNOLOGY