Pei-Cheng Hsu

Person

New Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask with alloy based absorbers
- Patent number 12,181,797
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating and servicing a photomask
- Patent number 12,169,357
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Fu Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Network type pellicle membrane and method for forming the same
- Patent number 12,153,339
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Extreme ultraviolet mask with tantalum base alloy absorber
- Patent number 12,153,337
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,147,154
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle enclosure for lithography systems
- Patent number 12,135,499
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for forming extreme ultraviolet mask comprising magnetic ma...
- Patent number 12,092,952
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kevin Tanady
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 12,085,843
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle assembly and method of making same
- Patent number 12,050,399
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,044,960
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 12,038,684
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blanks and methods for depositing layers on mask blank
- Patent number 12,019,367
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,013,630
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle having vent hole
- Patent number 12,013,632
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protection layer on low thermal expansion material (LTEM) substrate...
- Patent number 12,001,132
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV masks to prevent carbon contamination
- Patent number 11,988,953
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
- Patent number 11,960,201
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Color wheel module and projector
- Patent number 11,947,103
- Issue date Apr 2, 2024
- Coretronic Corporation
- Pei-Yu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Respiratory function testing system and respiratory function testin...
- Patent number 11,925,454
- Issue date Mar 12, 2024
- Chia-Chi Su
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle and method of using the same
- Patent number 11,868,041
- Issue date Jan 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask with tantalum base alloy absorber
- Patent number 11,852,965
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask with a black border regions and method of fabricat...
- Patent number 11,852,966
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chin-Hsiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method for photo masks and apparatus therefor
- Patent number 11,852,969
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 11,829,062
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV mask blank and method of making EUV mask blank
- Patent number 11,815,804
- Issue date Nov 14, 2023
- Ping-Hsun Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 11,789,356
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission device of hospital bed
- Patent number 11,744,753
- Issue date Sep 5, 2023
- NANTONG SHUNLONG PHYSICAL THERAPY EQUIPMENT CO., LTD.
- Pei-Yu Hsu
- A47 - FURNITURE DOMESTIC ARTICLES OR APPLIANCES COFFEE MILLS SPICE MILLS SUCT...
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 11,726,399
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating and servicing a photomask
- Patent number 11,714,350
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Fu Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FABRICATING AND SERVICING A PHOTOMASK
- Publication number 20250068060
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fu YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...
- Publication number 20240393674
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kevin TANADY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH...
- Publication number 20240384410
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Hao LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20240385506
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING EUV PHOTO MASKS
- Publication number 20240369918
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS
- Publication number 20240369921
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATION OF NANOTUBE BUNDLES AND REACTORS FOR THE SAME
- Publication number 20240351881
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Dung-Yue SU
- C01 - INORGANIC CHEMISTRY
Information Patent Application
PELLICLE ASSEMBLY AND METHOD OF MAKING SAME
- Publication number 20240345472
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE AND METHOD OF MANUFACTURING THEREOF
- Publication number 20240345471
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF MAKING A SEMICONDUCTOR DEVICE
- Publication number 20240337917
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20240329517
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK
- Publication number 20240302731
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE AND METHOD OF MANUFACTURING THEREOF
- Publication number 20240302735
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Tung KUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method Of Critical Dimension Control By Oxygen And Nitrogen Plasma...
- Publication number 20240264520
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR NEAR FIELD COMMUNICATION WITH SERIAL INTERFACE MICROCONT...
- Publication number 20240256802
- Publication date Aug 1, 2024
- Generalplus Technology Inc.
- Li Sheng LO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AIR BAFFLE FIXING STRUCTURE AND AIR GUIDING DEVICE
- Publication number 20240231446
- Publication date Jul 11, 2024
- WISTRON NEWEB CORPORATION
- Yu-Shuo WU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH TANTALUM BASE ALLOY ABSORBER
- Publication number 20240192581
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLOR WHEEL MODULE AND PROJECTOR
- Publication number 20240126067
- Publication date Apr 18, 2024
- CORETRONIC CORPORATION
- Pei-Yu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND STRUCTURE INCLUDING A PELLICLE
- Publication number 20240103358
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240094626
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR
- Publication number 20240085781
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MEASURING AND MANUFACTURING THE PHOTOMASK
- Publication number 20240077804
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240069427
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Pi SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM
- Publication number 20240053676
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Hao CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER
- Publication number 20240045318
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK AND METHOD FOR FORMING THE SAME
- Publication number 20240045317
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVELENGTH CONVERSION DEVICE AND PROJECTION DEVICE
- Publication number 20240036452
- Publication date Feb 1, 2024
- CORETRONIC CORPORATION
- Pei-Yu Hsu
- G02 - OPTICS
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240036459
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Hao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240036462
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- C01 - INORGANIC CHEMISTRY
Information Patent Application
PELLICLE MEMBRANE WITH IMPROVED PROPERTIES
- Publication number 20240004284
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY

Pei-Cheng Hsu

Person

Patents Grantslast 30 patents

Extreme ultraviolet mask with alloy based absorbers

Method of fabricating and servicing a photomask

Network type pellicle membrane and method for forming the same

Extreme ultraviolet mask with tantalum base alloy absorber

EUV photo masks and manufacturing method thereof

Reticle enclosure for lithography systems

Methods for forming extreme ultraviolet mask comprising magnetic ma...

Method of manufacturing EUV photo masks

Pellicle assembly and method of making same

EUV photo masks and manufacturing method thereof

Reflective mask and fabricating method thereof

Mask blanks and methods for depositing layers on mask blank

EUV photo masks and manufacturing method thereof

Pellicle having vent hole

Protection layer on low thermal expansion material (LTEM) substrate...

EUV masks to prevent carbon contamination

Method of critical dimension control by oxygen and nitrogen plasma...

Color wheel module and projector

Respiratory function testing system and respiratory function testin...

Method for extreme ultraviolet lithography mask treatment

Pellicle and method of using the same

Extreme ultraviolet mask with tantalum base alloy absorber

Lithography mask with a black border regions and method of fabricat...

Cleaning method for photo masks and apparatus therefor

EUV photo masks and manufacturing method thereof

EUV mask blank and method of making EUV mask blank

Method of manufacturing EUV photo masks

Transmission device of hospital bed

EUV photo masks and manufacturing method thereof

Method of fabricating and servicing a photomask

Patents Applicationslast 30 patents

METHOD OF FABRICATING AND SERVICING A PHOTOMASK

METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...

SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH...

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

METHOD OF MANUFACTURING EUV PHOTO MASKS

RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

FABRICATION OF NANOTUBE BUNDLES AND REACTORS FOR THE SAME

PELLICLE ASSEMBLY AND METHOD OF MAKING SAME

PELLICLE AND METHOD OF MANUFACTURING THEREOF

METHODS OF MAKING A SEMICONDUCTOR DEVICE

PELLICLE HAVING VENT HOLE

REFLECTIVE MASK

PELLICLE AND METHOD OF MANUFACTURING THEREOF

Method Of Critical Dimension Control By Oxygen And Nitrogen Plasma...

METHOD FOR NEAR FIELD COMMUNICATION WITH SERIAL INTERFACE MICROCONT...

AIR BAFFLE FIXING STRUCTURE AND AIR GUIDING DEVICE

EXTREME ULTRAVIOLET MASK WITH TANTALUM BASE ALLOY ABSORBER

COLOR WHEEL MODULE AND PROJECTOR

SYSTEM AND STRUCTURE INCLUDING A PELLICLE

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR

PHOTOMASK AND METHODS FOR MEASURING AND MANUFACTURING THE PHOTOMASK

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM

EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER

MASK AND METHOD FOR FORMING THE SAME

WAVELENGTH CONVERSION DEVICE AND PROJECTION DEVICE

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

PELLICLE MEMBRANE WITH IMPROVED PROPERTIES