Peng-Soon Lim

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Kluang, TW

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Patents Grantslast 30 patents

Information Patent Grant
Metal gate electrode of a field effect transistor
- Patent number 9,196,691
- Issue date Nov 24, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hao Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for metal gate formation with wider metal gate fi...
- Patent number 8,716,785
- Issue date May 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming metal gates in a gate last process
- Patent number 7,871,915
- Issue date Jan 18, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-metal-oxide high-K gate dielectrics
- Patent number 7,824,990
- Issue date Nov 2, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Vincent S. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming integrated circuit devices having n-MOSFET and p-...
- Patent number 7,465,634
- Issue date Dec 16, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240055260
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE ELECTRODE OF A FIELD EFFECT TRANSISTOR
- Publication number 20140004694
- Publication date Jan 2, 2014
- Taiwan Semiconductor Manufacturing company Ltd.
- Cheng-Hao HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR METAL GATE FORMATION WITH WIDER METAL GATE FI...
- Publication number 20120217578
- Publication date Aug 30, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING METAL GATES IN A GATE LAST PROCESS
- Publication number 20100081262
- Publication date Apr 1, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming integrated circuit devices having n-MOSFET and p-...
- Publication number 20080096336
- Publication date Apr 24, 2008
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-metal-oxide high-k gate dielectrics
- Publication number 20070128736
- Publication date Jun 7, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Vincent S. Chang
- H01 - BASIC ELECTRIC ELEMENTS