Peter Baumann

Person

Deutschland, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for high-throughput chemical vapor deposition
- Patent number 8,906,456
- Issue date Dec 9, 2014
- Aixtron, Inc.
- Piotr Strzyzewski
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Gas distributor with pre-chambers arranged in planes
- Patent number 8,349,081
- Issue date Jan 8, 2013
- Aixtron SE
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas inlet element for a CVD reactor
- Patent number 8,298,337
- Issue date Oct 30, 2012
- Aixtron, Inc.
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for self-limiting deposition of one or more monolayers
- Patent number 8,114,480
- Issue date Feb 14, 2012
- Aixtron Inc.
- Peter Baumann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for depositing layers containing silicon and germanium
- Patent number 7,732,308
- Issue date Jun 8, 2010
- Aixtron, Inc.
- Marcus Schumacher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and apparatus for depositing single-component or multi-comp...
- Patent number 7,410,670
- Issue date Aug 12, 2008
- Aixtron AG
- Marcus Schumacher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR HIGH-THROUGHPUT CHEMICAL VAPOR DEPOSITION
- Publication number 20140030434
- Publication date Jan 30, 2014
- AIXTRON INC.
- Piotr Strzyzewski
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PROCESS FOR DEPOSITING LAYERS CONTAINING SILICON AND GERMANIUM
- Publication number 20090081853
- Publication date Mar 26, 2009
- Marcus Schumacher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INLET ELEMENT FOR A CVD REACTOR
- Publication number 20090025639
- Publication date Jan 29, 2009
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTOR WITH PRE-CHAMBERS DISPOSED IN PLANES
- Publication number 20090013930
- Publication date Jan 15, 2009
- Markus Reinhold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Depositing in Particular Metal Oxides by Means of Discon...
- Publication number 20080274278
- Publication date Nov 6, 2008
- Peter Baumann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for high-throughput chemical vapor deposition
- Publication number 20080096369
- Publication date Apr 24, 2008
- Piotr Strzyzewski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for self-limiting deposition of one or more monolayers
- Publication number 20070293055
- Publication date Dec 20, 2007
- Peter Baumann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for the self-limiting deposition of one or more monolayers
- Publication number 20070009659
- Publication date Jan 11, 2007
- Peter Baumann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process and apparatus for depositing single-component or multi-comp...
- Publication number 20060249081
- Publication date Nov 9, 2006
- Marcus Schumacher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Device for depositing thin layers with a wireless detection of proc...
- Publication number 20050092246
- Publication date May 5, 2005
- Peter Baumann
- C30 - CRYSTAL GROWTH

Peter Baumann

Person

Patents Grantslast 30 patents

Apparatus and method for high-throughput chemical vapor deposition

Gas distributor with pre-chambers arranged in planes

Gas inlet element for a CVD reactor

Method for self-limiting deposition of one or more monolayers

Process for depositing layers containing silicon and germanium

Process and apparatus for depositing single-component or multi-comp...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR HIGH-THROUGHPUT CHEMICAL VAPOR DEPOSITION

PROCESS FOR DEPOSITING LAYERS CONTAINING SILICON AND GERMANIUM

GAS INLET ELEMENT FOR A CVD REACTOR

GAS DISTRIBUTOR WITH PRE-CHAMBERS DISPOSED IN PLANES

Method for Depositing in Particular Metal Oxides by Means of Discon...

Apparatus and method for high-throughput chemical vapor deposition

Method for self-limiting deposition of one or more monolayers

Process for the self-limiting deposition of one or more monolayers

Process and apparatus for depositing single-component or multi-comp...

Device for depositing thin layers with a wireless detection of proc...