Peter De Schepper

Person

Hoboken, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic radiation patternable coatings with low defectivity...
- Patent number 12,072,626
- Issue date Aug 27, 2024
- Inpria Corporation
- Benjamin L. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process environment for inorganic resist patterning
- Patent number 11,947,262
- Issue date Apr 2, 2024
- Inpria Corporation
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
- Patent number 11,886,116
- Issue date Jan 30, 2024
- Inpria Corporation
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned organometallic photoresists and methods of patterning
- Patent number 11,480,874
- Issue date Oct 25, 2022
- Inpria Corporation
- Michael Kocsis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for blocking a trench portion
- Patent number 10,490,442
- Issue date Nov 26, 2019
- Imec VZW
- Boon Teik Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma method for reducing post-lithography line width roughness
- Patent number 9,520,298
- Issue date Dec 13, 2016
- Imec VZW
- Peter De Schepper
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20250164887
- Publication date May 22, 2025
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...
- Publication number 20240369923
- Publication date Nov 7, 2024
- INPRIA CORPORATION
- Benjamin L. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20240272557
- Publication date Aug 15, 2024
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20240118614
- Publication date Apr 11, 2024
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAS-BASED DEVELOPMENT OF ORGANOMETALLIC RESIST IN AN OXIDIZING HALO...
- Publication number 20230408916
- Publication date Dec 21, 2023
- Inpria Corpoartion
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION LATENT IMAGE PROCESSING, CONTRAST ENHANCEMENT AND T...
- Publication number 20230100995
- Publication date Mar 30, 2023
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED ORGANOMETALLIC PHOTORESISTS AND METHODS OF PATTERNING
- Publication number 20230012169
- Publication date Jan 12, 2023
- INPRIA CORPORATION
- Michael Kocsis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...
- Publication number 20220269169
- Publication date Aug 25, 2022
- INPRIA CORPORATION
- Benjamin L. Clark
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20210349390
- Publication date Nov 11, 2021
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20210271170
- Publication date Sep 2, 2021
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED ORGANOMETALLIC PHOTORESISTS AND METHODS OF PATTERNING
- Publication number 20200124970
- Publication date Apr 23, 2020
- INPRIA CORPORATION
- Michael Kocsis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Blocking a Trench Portion
- Publication number 20180240699
- Publication date Aug 23, 2018
- IMEC vzw
- Boon Teik Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Method for Reducing Post-Lithography Line Width Roughness
- Publication number 20150228497
- Publication date Aug 13, 2015
- Katholieke Universiteit Leuven, K.U.Leuven R&D
- Peter De Schepper
- H01 - BASIC ELECTRIC ELEMENTS

Peter De Schepper

Person

Patents Grantslast 30 patents

Stabilized interfaces of inorganic radiation patterning composition...

Organometallic radiation patternable coatings with low defectivity...

Process environment for inorganic resist patterning

Multiple patterning with organometallic photopatternable layers wit...

Patterned organometallic photoresists and methods of patterning

Method for blocking a trench portion

Plasma method for reducing post-lithography line width roughness

Patents Applicationslast 30 patents

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

GAS-BASED DEVELOPMENT OF ORGANOMETALLIC RESIST IN AN OXIDIZING HALO...

HIGH RESOLUTION LATENT IMAGE PROCESSING, CONTRAST ENHANCEMENT AND T...

PATTERNED ORGANOMETALLIC PHOTORESISTS AND METHODS OF PATTERNING

ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

PATTERNED ORGANOMETALLIC PHOTORESISTS AND METHODS OF PATTERNING

Method for Blocking a Trench Portion

Plasma Method for Reducing Post-Lithography Line Width Roughness