Peter Gerardus JONKERS

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, a projection system and a device manufactur...
- Patent number 10,310,394
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Yuri Johannes Gabriel Van De Vijver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining a suppression factor of a suppres...
- Patent number 8,711,325
- Issue date Apr 29, 2014
- ASML Netherlands B.V.
- Hendrikus Gijsbertus Schimmel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus configured to suppress contamination from pa...
- Patent number 8,625,068
- Issue date Jan 7, 2014
- ASML Netherlands B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,289,498
- Issue date Oct 16, 2012
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTUR...
- Publication number 20170097579
- Publication date Apr 6, 2017
- ASML NETHERLANDS B.V.
- Yuri Johannes Gabriel VAN DE VIJVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20120002182
- Publication date Jan 5, 2012
- ASML NETHERLANDS B.V.
- Han-Kwang Nienhuys
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRES...
- Publication number 20110261329
- Publication date Oct 27, 2011
- ASML NETHERLANDS B.V.
- Hendrikus Gijsbertus Schimmel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTUR...
- Publication number 20100309447
- Publication date Dec 9, 2010
- ASML NETHERLANDS B.V.
- Yuri Johannes Gabriel Van de Vijver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100002207
- Publication date Jan 7, 2010
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Peter Gerardus JONKERS

Person

Patents Grantslast 30 patents

Prolonging optical element lifetime in an EUV lithography system

Prolonging optical element lifetime in an EUV lithography system

Lithographic apparatus, a projection system and a device manufactur...

Method and system for determining a suppression factor of a suppres...

Lithographic apparatus configured to suppress contamination from pa...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTUR...

Lithographic Apparatus and Method

METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRES...

LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTUR...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD