Peter Hanzen WARDENIER

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to reduce effects of nonlinear behavior
- Patent number 11,036,146
- Issue date Jun 15, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for increasing accuracy of pattern positioning
- Patent number 10,996,573
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,915,689
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,719,011
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Peter Ten Berge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,691,863
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of metrology, inspection apparatus, lithographic system and...
- Patent number 9,958,789
- Issue date May 1, 2018
- ASML Netherlands B.V.
- Peter Hanzen Wardenier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring asymmetry, inspection apparatus, lithographic s...
- Patent number 9,786,044
- Issue date Oct 10, 2017
- ASML Netherlands B.V.
- Andreas Fuchs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction method for non-uniform reticle heating in a lithographic...
- Patent number 8,184,265
- Issue date May 22, 2012
- ASML Netherlands B.V.
- Peter Hanzen Wardenier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus and a device manufacturing method
- Patent number 7,511,799
- Issue date Mar 31, 2009
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Magnetic resonance apparatus
- Patent number 5,742,165
- Issue date Apr 21, 1998
- U.S. Philips Corporation
- Jeroen Snelten
- G01 - MEASURING TESTING
Information Patent Grant
Magnetic resonance apparatus having a wideband matching network
- Patent number 5,450,011
- Issue date Sep 12, 1995
- U.S. Philips Corporation
- Gerardus W. Boeijen
- G01 - MEASURING TESTING
Information Patent Grant
Magnetic resonance device and signal combination device
- Patent number 5,319,309
- Issue date Jun 7, 1994
- U.S. Philips Corporation
- Johannes H. den Boef
- G01 - MEASURING TESTING
Information Patent Grant
RF coil system in a magnetic resonance imaging apparatus
- Patent number 5,272,437
- Issue date Dec 21, 1993
- U.S. Philips Corporation
- Peter H. Wardenier
- G01 - MEASURING TESTING
Information Patent Grant
Magnetic resonance apparatus having an improved RF coil
- Patent number 4,952,878
- Issue date Aug 28, 1990
- U.S. Philips Corporation
- Wilhelmus R. M. Mens
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR INCREASING ACCURACY OF PATTERN POSITIONING
- Publication number 20200124989
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180322237
- Publication date Nov 8, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR
- Publication number 20180314168
- Publication date Nov 1, 2018
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180307135
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180252998
- Publication date Sep 6, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20180046737
- Publication date Feb 15, 2018
- ASML NETHERLANDS B.V.
- Lotte Marloes WILLEMS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Metrology, Inspection Apparatus, Lithographic System and...
- Publication number 20160370710
- Publication date Dec 22, 2016
- ASML NETHERLANDS B.V.
- Peter Hanzen WARDENIER
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MEASURING ASYMMETRY, INSPECTION APPARATUS, LITHOGRAPHIC S...
- Publication number 20160180517
- Publication date Jun 23, 2016
- ASML NETHERLANDS B.V.
- Andreas FUCHS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Correction Method for Non-Uniform Reticle Heating in a Lithographic...
- Publication number 20090323039
- Publication date Dec 31, 2009
- ASML NETHERLANDS B.V.
- Peter Hanzen WARDENIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic projection apparatus and a device manufacturing method
- Publication number 20070177123
- Publication date Aug 2, 2007
- ASML NETHERLANDS B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Peter Hanzen WARDENIER

Person

Patents Grantslast 30 patents

Method and apparatus to reduce effects of nonlinear behavior

Method and system for increasing accuracy of pattern positioning

Method and apparatus to correct for patterning process error

Method and apparatus to correct for patterning process error

Method and apparatus to correct for patterning process error

Method of metrology, inspection apparatus, lithographic system and...

Method of measuring asymmetry, inspection apparatus, lithographic s...

Correction method for non-uniform reticle heating in a lithographic...

Lithographic projection apparatus and a device manufacturing method

Magnetic resonance apparatus

Magnetic resonance apparatus having a wideband matching network

Magnetic resonance device and signal combination device

RF coil system in a magnetic resonance imaging apparatus

Magnetic resonance apparatus having an improved RF coil

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR INCREASING ACCURACY OF PATTERN POSITIONING

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

Method of Metrology, Inspection Apparatus, Lithographic System and...

METHOD OF MEASURING ASYMMETRY, INSPECTION APPARATUS, LITHOGRAPHIC S...

Correction Method for Non-Uniform Reticle Heating in a Lithographic...

Lithographic projection apparatus and a device manufacturing method