Peter Hillman

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,915,950
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber for multiple precursor flow
- Patent number 11,276,559
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,276,590
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seasoning process for establishing a stable process and extending c...
- Patent number 11,164,724
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Sang Won Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window widening using coated parts in plasma etch processes
- Patent number 11,101,136
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window widening using coated parts in plasma etch processes
- Patent number 10,297,458
- Issue date May 21, 2019
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seasoning process for establishing a stable process and extending c...
- Patent number 10,008,366
- Issue date Jun 26, 2018
- Applied Materials, Inc.
- Sang Won Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grooved insulator to reduce leakage current
- Patent number 9,659,753
- Issue date May 23, 2017
- Applied Materials, Inc.
- Tae Cho
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS
- Publication number 20220148894
- Publication date May 12, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW
- Publication number 20190311883
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES
- Publication number 20190272998
- Publication date Sep 5, 2019
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES
- Publication number 20190043726
- Publication date Feb 7, 2019
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS
- Publication number 20180337074
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING C...
- Publication number 20180337021
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Sang Won KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW
- Publication number 20180337057
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING C...
- Publication number 20170069463
- Publication date Mar 9, 2017
- Applied Materials, Inc.
- Sang Won KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROOVED INSULATOR TO REDUCE LEAKAGE CURRENT
- Publication number 20160042920
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- TAE CHO
- H01 - BASIC ELECTRIC ELEMENTS

Peter Hillman

Person

Patents Grantslast 30 patents

Multi-zone semiconductor substrate supports

Semiconductor processing chamber for multiple precursor flow

Multi-zone semiconductor substrate supports

Seasoning process for establishing a stable process and extending c...

Process window widening using coated parts in plasma etch processes

Process window widening using coated parts in plasma etch processes

Seasoning process for establishing a stable process and extending c...

Grooved insulator to reduce leakage current

Patents Applicationslast 30 patents

MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS

SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW

PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES

PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES

MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS

SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING C...

SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW

SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING C...

GROOVED INSULATOR TO REDUCE LEAKAGE CURRENT