Peter Huber

Person

Heidenheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,086,055
- Issue date Aug 10, 2021
- Carl Zeiss SMT GmbH
- Peter Huber
- G02 - OPTICS
Information Patent Grant
Wavefront correction element for use in an optical system
- Patent number 10,684,553
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Peter Huber
- G02 - OPTICS
Information Patent Grant
Method for producing a mirror element
- Patent number 10,423,073
- Issue date Sep 24, 2019
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element
- Patent number 10,338,476
- Issue date Jul 2, 2019
- Carl Zeiss SMT GmbH
- Peter Huber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for EUV lithography, EUV lithography apparatus and method for...
- Patent number 10,156,782
- Issue date Dec 18, 2018
- Carl Zeiss SMT GmbH
- Peter Huber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element and optical system for EUV lithography
- Patent number 9,996,005
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 9,810,993
- Issue date Nov 7, 2017
- Carl Zeiss SMT GmbH
- Peter Huber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mirror for the EUV wavelength range, method for producing such a mi...
- Patent number 9,696,632
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Peter Huber
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Arrangement for and method of characterising the polarization prope...
- Patent number 9,274,440
- Issue date Mar 1, 2016
- Carl Zeiss SMT GmbH
- Uwe Hempelmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element for reflection of UV radiation, method for manufact...
- Patent number 8,488,103
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Alexandra Pazidis
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM
- Publication number 20200033735
- Publication date Jan 30, 2020
- Carl Zeiss SMT GMBH
- Peter HUBER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20190339428
- Publication date Nov 7, 2019
- Carl Zeiss SMT GMBH
- Peter HUBER
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20180307142
- Publication date Oct 25, 2018
- Carl Zeiss SMT GMBH
- Peter HUBER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTIPART COIN BLANK AND COIN
- Publication number 20180012437
- Publication date Jan 11, 2018
- Saxonia EuroCoin GmbH
- Thomas Bilas
- G07 - CHECKING-DEVICES
Information Patent Application
Mask for EUV Lithography, EUV Lithography Apparatus and Method for...
- Publication number 20170219920
- Publication date Aug 3, 2017
- Carl Zeiss SMT GMBH
- Peter HUBER
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PRODUCING A MIRROR ELEMENT
- Publication number 20160342093
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20160246179
- Publication date Aug 25, 2016
- Carl Zeiss SMT GMBH
- Peter HUBER
- G02 - OPTICS
Information Patent Application
Mirror for the EUV Wavelength Range, Method for Producing such a Mi...
- Publication number 20150055108
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Peter Huber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Optical Elements Comprising Magnetostrictive Material
- Publication number 20150043060
- Publication date Feb 12, 2015
- Carl Zeiss SMT GMBH
- Peter Huber
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
- Publication number 20140199543
- Publication date Jul 17, 2014
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multipart Coin Blank and Coin
- Publication number 20140144751
- Publication date May 29, 2014
- Thomas Bilas
- G07 - CHECKING-DEVICES
Information Patent Application
ARRANGEMENT FOR AND METHOD OF CHARACTERISING THE POLARISATION PROPE...
- Publication number 20130021592
- Publication date Jan 24, 2013
- Carl Zeiss SMT GMBH
- Uwe HEMPELMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACT...
- Publication number 20100290021
- Publication date Nov 18, 2010
- Carl Zeiss SMT AG
- Alexandra PAZIDIS
- G02 - OPTICS

Peter Huber

Person

Patents Grantslast 30 patents

Mirror, in particular for a microlithographic projection exposure a...

Wavefront correction element for use in an optical system

Method for producing a mirror element

Reflective optical element

Mask for EUV lithography, EUV lithography apparatus and method for...

Reflective optical element and optical system for EUV lithography

Mirror, in particular for a microlithographic projection exposure a...

Mirror for the EUV wavelength range, method for producing such a mi...

Arrangement for and method of characterising the polarization prope...

Optical element for reflection of UV radiation, method for manufact...

Patents Applicationslast 30 patents

WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

REFLECTIVE OPTICAL ELEMENT

MULTIPART COIN BLANK AND COIN

Mask for EUV Lithography, EUV Lithography Apparatus and Method for...

METHOD FOR PRODUCING A MIRROR ELEMENT

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

Mirror for the EUV Wavelength Range, Method for Producing such a Mi...

Optical Elements Comprising Magnetostrictive Material

REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

Multipart Coin Blank and Coin

ARRANGEMENT FOR AND METHOD OF CHARACTERISING THE POLARISATION PROPE...

OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACT...