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Peter Hubler
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Coswig, DE
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Patents Grants
last 30 patents
Information
Patent Grant
Void formation monitoring in a damascene process
Patent number
6,964,874
Issue date
Nov 15, 2005
Advanced Micro Devices, Inc.
Thomas Werner
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor device with a copper line having an increased resista...
Patent number
6,806,191
Issue date
Oct 19, 2004
Advanced Micro Devices, Inc.
Christian Zistl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Interface void monitoring in a damascene process
Patent number
6,716,650
Issue date
Apr 6, 2004
Advanced Micro Devices, Inc.
Eckhard Langer
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metallization process sequence for a barrier metal layer
Patent number
6,613,660
Issue date
Sep 2, 2003
Advanced Micro Devices, Inc.
Volker Kahlert
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Semiconductor device with a copper line having an increased resista...
Publication number
20030224599
Publication date
Dec 4, 2003
Christian Zistl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Void formation monitoring in a damascene process
Publication number
20030082901
Publication date
May 1, 2003
Thomas Werner
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Metallization process sequence
Publication number
20030054625
Publication date
Mar 20, 2003
Volker Kahlert
H01 - BASIC ELECTRIC ELEMENTS